RESIST COATING METHOD

PURPOSE:To form a uniform photoresist layer even on the surface having irregularity by a method wherein no crystal is formed in the center of rotation of a spinner, the spinner is rotated at high speed by forming the crystal on the part away from the center, and the stripe direction of the irregular...

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Bibliographische Detailangaben
1. Verfasser:	OKI YOSHIMASA
Format:	Patent
Sprache:	eng
Schlagworte:	APPARATUS FOR APPLYING LIQUIDS OR OTHER FLUENT MATERIALS TOSURFACES, IN GENERAL APPARATUS SPECIALLY ADAPTED THEREFOR APPLYING LIQUIDS OR OTHER FLUENT MATERIALS TO SURFACES, IN GENERAL BASIC ELECTRIC ELEMENTS CINEMATOGRAPHY ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY ELECTROGRAPHY HOLOGRAPHY MATERIALS THEREFOR ORIGINALS THEREFOR PERFORMING OPERATIONS PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS PROCESSES FOR APPLYING LIQUIDS OR OTHER FLUENT MATERIALS TOSURFACES, IN GENERAL SEMICONDUCTOR DEVICES SPRAYING OR ATOMISING IN GENERAL TRANSPORTING
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Beschreibung
Zusammenfassung:	PURPOSE:To form a uniform photoresist layer even on the surface having irregularity by a method wherein no crystal is formed in the center of rotation of a spinner, the spinner is rotated at high speed by forming the crystal on the part away from the center, and the stripe direction of the irregularity is set in such a manner that it is brought in the radial direction of rotation. CONSTITUTION:A substrate 3 of a crystal of gallium arsenide is provided on the rotary disc 1 of the spinner having a stopper 11 with which the scattering of crystal is prevented. The rotary disc 1 rotated by a rotating shaft, a number of stripe-formed protruding parts 3' of 100 mum in width, a period of 500 mum and 2000Angstrom in height are formed. When crystal is going to be formed on the rotating disc, the direction of stripe is brought in the radial direction of the disc, and a crystal substrate 3 is provided at the position away from the rotating shaft 3 of the rotary disc 1. As a result, the thin film of uniform photoresist can be formed by avoiding the effect of the recessed and the protrusions even on the crystal having stripelike irregularity.