MATERIAL FOR VACUUM DEPOSITION

PURPOSE:To simply obtain a low-cost material for vacuum-depositing a thin SiO film with high productivity by mixing metallic Si with SiO2 and sintering the mixture. CONSTITUTION:Metallic Si powder is well mixed with SiO2 powder preferably in about 1:1 molar ratio. The powdery mixture is compacted an...

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Bibliographische Detailangaben
1. Verfasser:	SUGAWARA NOBORU
Format:	Patent
Sprache:	eng
Schlagworte:	CHEMICAL SURFACE TREATMENT CHEMISTRY COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING MATERIAL WITH METALLIC MATERIAL COATING METALLIC MATERIAL DIFFUSION TREATMENT OF METALLIC MATERIAL INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL METALLURGY SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION
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Beschreibung
Zusammenfassung:	PURPOSE:To simply obtain a low-cost material for vacuum-depositing a thin SiO film with high productivity by mixing metallic Si with SiO2 and sintering the mixture. CONSTITUTION:Metallic Si powder is well mixed with SiO2 powder preferably in about 1:1 molar ratio. The powdery mixture is compacted and sintered at about 1,300 deg.C for about 2hr in a gaseous Ar atmosphere or the like to obtain a material for vacuum-depositing a thin SiO film in the form of pellets or the like. When vacuum deposition is carried out with the material, a thin SiO film having performance and strength comparable to those of a thin film obtd. by vacuum deposition with conventional SiO pellets is obtd.