HEAT TREATING DEVICE FOR MULTIPLE STRUCTURED VERTICAL SEMICONDUCTOR

PURPOSE:To prevent air from invading into an inner reaction tube and to eliminate the possibility of generating an unnecessary chemical reaction on a wafer by supplying and filling inert gas to the tube from the time when a wafer boat is housed in the holding means of the tube. CONSTITUTION:A boat loader 24 supports a wafer boat 22 to so support an inner reaction tube 18 as to accommodate the boat 22, and convey the boat 22 into or out of an outer reaction tube 16. Holding means contains and holds the tube 18. Inert gas passage means has a first passage 52 for inert gas to be supplied to the tube 18, and a second passage 76 provided at the side or closed end face of the tube 18. Inert gas is supplied to and filled in the tube 18 from the time when the boat 22 is contained in the holding means. Thus, it prevents air from invading into the tube 18 and eliminates the possibility of generating an unnecessary chemical reaction.