MANUFACTURE OF MAGNETIC HEAD

MANUFACTURE OF MAGNETIC HEAD

PURPOSE:To prevent air bubbles from being caused at the melting of gap forming face by sputtering SiO2 film to a gap forming face of a core, applying heat treatment to the SiO2 film and sputtering a glass film onto the SiO2 film even when the SiO2 film is sputtered in the system with a faster adheri...

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Hauptverfasser: OKI TOKUAKI, SAOSHITA SOUSHI
Format: Patent
Sprache:eng
Schlagworte:
INFORMATION STORAGE
INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORDCARRIER AND TRANSDUCER
PHYSICS
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creator OKI TOKUAKI
SAOSHITA SOUSHI
description PURPOSE:To prevent air bubbles from being caused at the melting of gap forming face by sputtering SiO2 film to a gap forming face of a core, applying heat treatment to the SiO2 film and sputtering a glass film onto the SiO2 film even when the SiO2 film is sputtered in the system with a faster adhering speed. CONSTITUTION:The SiO2 film is sputtered to the gap forming face of a core and heat treatment is applied to the SiO2 film and the glass film is sputtered onto the SiO2 film and the gap forming faces of the core are butted to melt the gap forming face by heating. For example, after SiO2 film is sputtered to the gap forming face of a couple of cores by the magnetron sputtering system, heat treatment is applied to the core to remove the sputter gas mixed in the sputter gas in the SiO2 film. After the sputter gas in the SiO2 film is removed, a glass film is sputtered onto the SiO2 film. Thus, no air bubble is caused to the gap in melting the gap forming face.
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fullrecord <record><control><sourceid>epo_EVB</sourceid><recordid>TN_cdi_epo_espacenet_JPS63275009A</recordid><sourceformat>XML</sourceformat><sourcesystem>PC</sourcesystem><sourcerecordid>JPS63275009A</sourcerecordid><originalsourceid>FETCH-epo_espacenet_JPS63275009A3</originalsourceid><addsrcrecordid>eNrjZJDxdfQLdXN0DgkNclXwd1PwdXT3cw3xdFbwcHV04WFgTUvMKU7lhdLcDIpuriHOHrqpBfnxqcUFicmpeakl8V4BwWbGRuamBgaWjsbEqAEAZkcg5Q</addsrcrecordid><sourcetype>Open Access Repository</sourcetype><iscdi>true</iscdi><recordtype>patent</recordtype></control><display><type>patent</type><title>MANUFACTURE OF MAGNETIC HEAD</title><source>esp@cenet</source><creator>OKI TOKUAKI ; SAOSHITA SOUSHI</creator><creatorcontrib>OKI TOKUAKI ; SAOSHITA SOUSHI</creatorcontrib><description>PURPOSE:To prevent air bubbles from being caused at the melting of gap forming face by sputtering SiO2 film to a gap forming face of a core, applying heat treatment to the SiO2 film and sputtering a glass film onto the SiO2 film even when the SiO2 film is sputtered in the system with a faster adhering speed. CONSTITUTION:The SiO2 film is sputtered to the gap forming face of a core and heat treatment is applied to the SiO2 film and the glass film is sputtered onto the SiO2 film and the gap forming faces of the core are butted to melt the gap forming face by heating. For example, after SiO2 film is sputtered to the gap forming face of a couple of cores by the magnetron sputtering system, heat treatment is applied to the core to remove the sputter gas mixed in the sputter gas in the SiO2 film. After the sputter gas in the SiO2 film is removed, a glass film is sputtered onto the SiO2 film. Thus, no air bubble is caused to the gap in melting the gap forming face.</description><language>eng</language><subject>INFORMATION STORAGE ; INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORDCARRIER AND TRANSDUCER ; PHYSICS</subject><creationdate>1988</creationdate><oa>free_for_read</oa><woscitedreferencessubscribed>false</woscitedreferencessubscribed></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><linktohtml>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&amp;date=19881111&amp;DB=EPODOC&amp;CC=JP&amp;NR=S63275009A$$EHTML$$P50$$Gepo$$Hfree_for_read</linktohtml><link.rule.ids>230,308,780,885,25564,76547</link.rule.ids><linktorsrc>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&amp;date=19881111&amp;DB=EPODOC&amp;CC=JP&amp;NR=S63275009A$$EView_record_in_European_Patent_Office$$FView_record_in_$$GEuropean_Patent_Office$$Hfree_for_read</linktorsrc></links><search><creatorcontrib>OKI TOKUAKI</creatorcontrib><creatorcontrib>SAOSHITA SOUSHI</creatorcontrib><title>MANUFACTURE OF MAGNETIC HEAD</title><description>PURPOSE:To prevent air bubbles from being caused at the melting of gap forming face by sputtering SiO2 film to a gap forming face of a core, applying heat treatment to the SiO2 film and sputtering a glass film onto the SiO2 film even when the SiO2 film is sputtered in the system with a faster adhering speed. CONSTITUTION:The SiO2 film is sputtered to the gap forming face of a core and heat treatment is applied to the SiO2 film and the glass film is sputtered onto the SiO2 film and the gap forming faces of the core are butted to melt the gap forming face by heating. For example, after SiO2 film is sputtered to the gap forming face of a couple of cores by the magnetron sputtering system, heat treatment is applied to the core to remove the sputter gas mixed in the sputter gas in the SiO2 film. After the sputter gas in the SiO2 film is removed, a glass film is sputtered onto the SiO2 film. Thus, no air bubble is caused to the gap in melting the gap forming face.</description><subject>INFORMATION STORAGE</subject><subject>INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORDCARRIER AND TRANSDUCER</subject><subject>PHYSICS</subject><fulltext>true</fulltext><rsrctype>patent</rsrctype><creationdate>1988</creationdate><recordtype>patent</recordtype><sourceid>EVB</sourceid><recordid>eNrjZJDxdfQLdXN0DgkNclXwd1PwdXT3cw3xdFbwcHV04WFgTUvMKU7lhdLcDIpuriHOHrqpBfnxqcUFicmpeakl8V4BwWbGRuamBgaWjsbEqAEAZkcg5Q</recordid><startdate>19881111</startdate><enddate>19881111</enddate><creator>OKI TOKUAKI</creator><creator>SAOSHITA SOUSHI</creator><scope>EVB</scope></search><sort><creationdate>19881111</creationdate><title>MANUFACTURE OF MAGNETIC HEAD</title><author>OKI TOKUAKI ; SAOSHITA SOUSHI</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-epo_espacenet_JPS63275009A3</frbrgroupid><rsrctype>patents</rsrctype><prefilter>patents</prefilter><language>eng</language><creationdate>1988</creationdate><topic>INFORMATION STORAGE</topic><topic>INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORDCARRIER AND TRANSDUCER</topic><topic>PHYSICS</topic><toplevel>online_resources</toplevel><creatorcontrib>OKI TOKUAKI</creatorcontrib><creatorcontrib>SAOSHITA SOUSHI</creatorcontrib><collection>esp@cenet</collection></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext_linktorsrc</fulltext></delivery><addata><au>OKI TOKUAKI</au><au>SAOSHITA SOUSHI</au><format>patent</format><genre>patent</genre><ristype>GEN</ristype><title>MANUFACTURE OF MAGNETIC HEAD</title><date>1988-11-11</date><risdate>1988</risdate><abstract>PURPOSE:To prevent air bubbles from being caused at the melting of gap forming face by sputtering SiO2 film to a gap forming face of a core, applying heat treatment to the SiO2 film and sputtering a glass film onto the SiO2 film even when the SiO2 film is sputtered in the system with a faster adhering speed. CONSTITUTION:The SiO2 film is sputtered to the gap forming face of a core and heat treatment is applied to the SiO2 film and the glass film is sputtered onto the SiO2 film and the gap forming faces of the core are butted to melt the gap forming face by heating. For example, after SiO2 film is sputtered to the gap forming face of a couple of cores by the magnetron sputtering system, heat treatment is applied to the core to remove the sputter gas mixed in the sputter gas in the SiO2 film. After the sputter gas in the SiO2 film is removed, a glass film is sputtered onto the SiO2 film. Thus, no air bubble is caused to the gap in melting the gap forming face.</abstract><oa>free_for_read</oa></addata></record>
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subjects INFORMATION STORAGE
INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORDCARRIER AND TRANSDUCER
PHYSICS
title MANUFACTURE OF MAGNETIC HEAD
url https://sfx.bib-bvb.de/sfx_tum?ctx_ver=Z39.88-2004&ctx_enc=info:ofi/enc:UTF-8&ctx_tim=2024-12-31T00%3A03%3A39IST&url_ver=Z39.88-2004&url_ctx_fmt=infofi/fmt:kev:mtx:ctx&rfr_id=info:sid/primo.exlibrisgroup.com:primo3-Article-epo_EVB&rft_val_fmt=info:ofi/fmt:kev:mtx:patent&rft.genre=patent&rft.au=OKI%20TOKUAKI&rft.date=1988-11-11&rft_id=info:doi/&rft_dat=%3Cepo_EVB%3EJPS63275009A%3C/epo_EVB%3E%3Curl%3E%3C/url%3E&disable_directlink=true&sfx.directlink=off&sfx.report_link=0&rft_id=info:oai/&rft_id=info:pmid/&rfr_iscdi=true