MANUFACTURE OF MAGNETIC HEAD

PURPOSE:To prevent air bubbles from being caused at the melting of gap forming face by sputtering SiO2 film to a gap forming face of a core, applying heat treatment to the SiO2 film and sputtering a glass film onto the SiO2 film even when the SiO2 film is sputtered in the system with a faster adhering speed. CONSTITUTION:The SiO2 film is sputtered to the gap forming face of a core and heat treatment is applied to the SiO2 film and the glass film is sputtered onto the SiO2 film and the gap forming faces of the core are butted to melt the gap forming face by heating. For example, after SiO2 film is sputtered to the gap forming face of a couple of cores by the magnetron sputtering system, heat treatment is applied to the core to remove the sputter gas mixed in the sputter gas in the SiO2 film. After the sputter gas in the SiO2 film is removed, a glass film is sputtered onto the SiO2 film. Thus, no air bubble is caused to the gap in melting the gap forming face.