VACUUM TREATMENT DEVICE

PURPOSE:To efficiently control the temp. of a material to be treated and to efficiently carry out the vacuum treatment by holding the material to be treated to heat by a heating plate and supporting the material to be treated by a supporting device to separate from the heating plate when the vacuum...

Ausführliche Beschreibung

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Bibliographische Detailangaben
Hauptverfasser: KURISAKI TETSUO, ANADA TAKAHIRO
Format: Patent
Sprache:eng
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Beschreibung
Zusammenfassung:PURPOSE:To efficiently control the temp. of a material to be treated and to efficiently carry out the vacuum treatment by holding the material to be treated to heat by a heating plate and supporting the material to be treated by a supporting device to separate from the heating plate when the vacuum treatment is carried out. CONSTITUTION:The material 2 to be treated is held by the heater 3 and heating plate 3 provided with a heat reflex plate 6 thereunder to heat the material to be treated to control to be at a specified temp. in a vacuum vessel 1 provided with a gas discharge opening 11. Then, a process gas is introduced from an introducing opening 10 and a high voltage is impressed to a target 7 disposed to be confronted to the material 2 to be treated from an electric power source 9 to generate plasma with the result the material of the target 7 is scattered to stick to the surface of the material 2 to be treated. In the above-mentioned vacuum treatment, the material 2 to be treated is supported with supporting shafts 14 and the heating plate 3 is supported by a shaft 13 so as to be movable vertically. In above-mentioned treatment, the material 2 to be treated is separated from the heating plate 3 by lowering the heating plate 3. As a result, the material 2 to be treated is prevented from overheating and the treatment is efficiently carried out.