ION BEAM VAPOR DEPOSITION DEVICE

PURPOSE:To enable two kinds of ion beams to be simultaneously radiated on a sample by making a high-tension reduction electrode to bend on the bisector of an angle formed by two ion beams, while making the angle to an earth potential reduction electrode equally changeable right and left, having the bisector in the center. CONSTITUTION:A high-tension reduction electrode 11 is divided into two sheets on the X-line in the bisector direction of an angle formed by the incident directions of an ion beam 14 and an ion beam 15, and linked by a hinge 16. The part of the hinge 16 is movably guided by an insulator guide rod 20 attached to an earth potential reduction electrode 12 so as to move on the X-line. That is, the electrode 11 is bent along the guide rod 20 by moving a linear leading-in device 17 in the Y-direction so as to form symmetrical and equal angles having the X-axis in the center in relation to two holes of the electrode 12. Thereby, the angle of the electrode 11 in relation to the electrode 12 is correlatively changed in relation to two beams through the linear leading-in device 17 so as to be able to put the spots of the ion beams together on a sample stand.