CHARGED PARTICLE BEAM LITHOGRAPHY

PURPOSE:To improve the accuracy of directly written patterns extending over in X and Y directions while correcting any shifting errors of stage and slip of beams etc., by means of providing fields having respectively overlapping framed regions before writing patterns. CONSTITUTION:Before writing rec...

Ausführliche Beschreibung

Bibliographische Detailangaben

Hauptverfasser:	YUASA TETSUO, KOSAKA YASUYUKI
Format:	Patent
Sprache:	eng
Schlagworte:	BASIC ELECTRIC ELEMENTS ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY SEMICONDUCTOR DEVICES
Online-Zugang:	Volltext bestellen
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