DISPROPORTIONATION OF SILANES

PURPOSE:To obtain a silane compound useful for high-purity silicone, etc., industrially and advantageously, by bringing a specific silane containing a Si-H bond into contact with a reaction product of a sulfonic acid of polyorganosiloxane skeleton and an amine compound to carry out disproportionatio...

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Bibliographische Detailangaben
Hauptverfasser: YANAGAWA NORIYUKI, INOUE KAORU, MURAKAMI MASAMI, MIYAGAWA HIROJI, ITO MASAYOSHI
Format: Patent
Sprache:eng
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Zusammenfassung:PURPOSE:To obtain a silane compound useful for high-purity silicone, etc., industrially and advantageously, by bringing a specific silane containing a Si-H bond into contact with a reaction product of a sulfonic acid of polyorganosiloxane skeleton and an amine compound to carry out disproportionation reaction. CONSTITUTION:A silane (e.g. trichlorosilane, etc.) shown by the formula (R is aliphatic group or aromatic group; X is halogen, alkoxy or aryloxy; l is 0-2 integer; m is 1-3 integer; l+m is 1-3 integer) containing at least one Si-H bond is brought into contact with a reaction product of a sulfonic acid of polyorganosiloxane skeleton and an amine compound (e.g. ammonia) and subjected to disproportionation reaction at 0-400 deg.C to give the aimed compound.