ANTIFUNGAL POLYMER

NEW MATERIAL:A vinyl polymer containing repeating units of the structure of the formula [wherein X is a residue of a fungicidal compound such as pentachlorophenol, p-chloro-m-cresol, o-phenylphenol, salicylanilide, 8- hydroxyquinoline, sodium-pentachlorophenate, 2-(4'-thiazolyl)benzimidazole, 1...

Ausführliche Beschreibung

Gespeichert in:
Bibliographische Detailangaben
Hauptverfasser: MITAMURA HIDEYUKI, ARIMATSU GIICHI
Format: Patent
Sprache:eng
Schlagworte:
Online-Zugang:Volltext bestellen
Tags: Tag hinzufügen
Keine Tags, Fügen Sie den ersten Tag hinzu!
Beschreibung
Zusammenfassung:NEW MATERIAL:A vinyl polymer containing repeating units of the structure of the formula [wherein X is a residue of a fungicidal compound such as pentachlorophenol, p-chloro-m-cresol, o-phenylphenol, salicylanilide, 8- hydroxyquinoline, sodium-pentachlorophenate, 2-(4'-thiazolyl)benzimidazole, 1,2-benzoisothiazolyl-3-one, 2,5-dibromo-4-methylaniline sodium, or 2- pyridinethiol-1-oxide]. USE:The title polymer useful as a polymeric fungicide which is excellent in hydrolysis resistance and mold resistance and can be used in a desirable shape or state. PREPARATION:A CH2-X group-containing styrene monomer is polymerized with, optionally, other monomers in a solvent in the presence of an initiator to obtain a polymer of an MW of 1,000-70,000.