MANUFACTURE OF ORGANOPOLYSILANE

Organopolysilanes are prepared by reacting at least one disilane of the formula R2R1Si2(OCH3)3, which may optionally be mixed with a compound of the formula R2Si2(OCH3)4, with at least one compound of the formula R2R2SiH in the presence of at least one compound of the formula MOR, where R represents...

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Bibliographische Detailangaben
Hauptverfasser:	NORUBERUTO TSUERAA, FUORUKAA FURAI, BERUNTO PASHIYARII
Format:	Patent
Sprache:	eng
Schlagworte:	ACYCLIC, CARBOCYCLIC OR HETEROCYCLIC COMPOUNDS CONTAININGELEMENTS OTHER THAN CARBON, HYDROGEN, HALOGEN, OXYGEN, NITROGEN,SULFUR, SELENIUM OR TELLURIUM APPARATUS SPECIALLY ADAPTED THEREFOR ARTIFICIAL STONE CEMENTS CERAMICS CHEMISTRY CINEMATOGRAPHY COMPOSITIONS BASED THEREON COMPOSITIONS THEREOF, e.g. MORTARS, CONCRETE OR LIKE BUILDINGMATERIALS COMPOUNDS THEREOF CONCRETE ELECTROGRAPHY HOLOGRAPHY INORGANIC CHEMISTRY LIME, MAGNESIA MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONSONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS MATERIALS THEREFOR METALLURGY NON-METALLIC ELEMENTS ORGANIC CHEMISTRY ORGANIC MACROMOLECULAR COMPOUNDS ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS REFRACTORIES SLAG THEIR PREPARATION OR CHEMICAL WORKING-UP TREATMENT OF NATURAL STONE
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Beschreibung
Zusammenfassung:	Organopolysilanes are prepared by reacting at least one disilane of the formula R2R1Si2(OCH3)3, which may optionally be mixed with a compound of the formula R2Si2(OCH3)4, with at least one compound of the formula R2R2SiH in the presence of at least one compound of the formula MOR, where R represents the same or different monovalent alkyl, alkenyl or aryl groups, R1 represents the same or different monovalent alkyl groups, R2 represents a methoxy group or R and M represents an alkali metal. These organopolysilanes are preferably used in preparing silicon carbide and in preparing negative photo-resist coatings.