MASK FOR PATTERN FORMATION
PURPOSE:To form a pattern with good accuracy by using an org. compd. contg. a diazo group which generates a change in the transmittance characteristic of light when irradiated with light or charged particles for a film to be formed on a mask plate. CONSTITUTION:The thin film layer 1 consisting of th...
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Format: | Patent |
Sprache: | eng |
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Zusammenfassung: | PURPOSE:To form a pattern with good accuracy by using an org. compd. contg. a diazo group which generates a change in the transmittance characteristic of light when irradiated with light or charged particles for a film to be formed on a mask plate. CONSTITUTION:The thin film layer 1 consisting of the org. compd. or the like contg. the diazo group which generates a change in the transmittance of light when irradiated with light or charged beam 3 is provided on a transparent glass plate 2 consisting of quartz, etc. The transmittance of the light increases to form a transmittable region 4 for light in the region of the layer 1 where the light or the beam 3 is irradiated. The process for manufacturing the mask which is hereto required in the conventional practice is eliminated if the pattern is formed in the above-mentioned manner. |
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