TREATER
PURPOSE:To increase the speed of treatment by irradiating a treating fluid and a material to be treated by ultraviolet rays and activating the treating fluid changed into plasma by ultraviolet exposure. CONSTITUTION:A wafer 3 on which a photo-resist is attached is placed on a susceptor 2 in a reacti...
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Format: | Patent |
Sprache: | eng |
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Zusammenfassung: | PURPOSE:To increase the speed of treatment by irradiating a treating fluid and a material to be treated by ultraviolet rays and activating the treating fluid changed into plasma by ultraviolet exposure. CONSTITUTION:A wafer 3 on which a photo-resist is attached is placed on a susceptor 2 in a reaction vessel 1. When the operation of exhaust is started through an exhaust pipe 15 and the degree of vacuum reaches a fixed value, oxygen gas 14 is made to flow into a plasma generating chamber 12. Microwaves radiated from a magnetron 5 are introduced into the vessel 1, and the gas 14 is changed into plasma. Ultraviolet rays radiated from an electrodeless discharge tube 9 fitted into a waveguide 7 further activate the gas 14 turned into plasma. |
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