JPS6239420B

This invention relates to a radiation-sensitive copying composition which comprises (a) a compound which forms an acid under the influence of actinic radiation, and (b) an organic polymeric compound which contains recurrent acetal or ketal groupings in its main chain and whose solubility in a liquid...

Ausführliche Beschreibung

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Bibliographische Detailangaben
Hauptverfasser: HANSU RUTSUKERUTO, GERUHARUTO BUURU, YURUGEN ZANDAA
Format: Patent
Sprache:eng
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Beschreibung
Zusammenfassung:This invention relates to a radiation-sensitive copying composition which comprises (a) a compound which forms an acid under the influence of actinic radiation, and (b) an organic polymeric compound which contains recurrent acetal or ketal groupings in its main chain and whose solubility in a liquid developer is increased by the action of an acid, each alpha -carbon atom of the alcoholic constituent of the acetal or ketal grouping of the organic polymeric compound being aliphatic. The invention also relates to a process for the production of relief images using a radiation-sensitive copying composition.