JPS6235102B

PURPOSE:To expose continuously and easily different kinds of patterns by using a mask having variable pattern regions in the main pattern region and secondary patterns in the variable pattern regions in an exposing method for obtaining different kinds of patterns with one mask pattern. CONSTITUTION:...

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Bibliographische Detailangaben
1. Verfasser:	MAJIMA NIWAJI
Format:	Patent
Sprache:	eng
Schlagworte:	APPARATUS SPECIALLY ADAPTED THEREFOR BASIC ELECTRIC ELEMENTS CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS CINEMATOGRAPHY ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR ELECTRICITY ELECTROGRAPHY HOLOGRAPHY MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS MATERIALS THEREFOR ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS PRINTED CIRCUITS SEMICONDUCTOR DEVICES
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Beschreibung
Zusammenfassung:	PURPOSE:To expose continuously and easily different kinds of patterns by using a mask having variable pattern regions in the main pattern region and secondary patterns in the variable pattern regions in an exposing method for obtaining different kinds of patterns with one mask pattern. CONSTITUTION:Different kinds of projected patterns are obtd. on a photoresist film with one mask pattern for transfer. At this time, a mask for exposure having variable pattern regions 12, 13 in the main pattern region 14 and secondary pattern regions 15, 16 each consisting of a group of unit patterns for giving a prescribed pattern in the regions 12, 13 is used, and the unit patterns can be selected according to the moving distances of the mask and the wafer. Thus, pattern circuits with slightly different shapes can be formed easily and continuously by exposure.