JPS6233580B

PURPOSE:To save manufacture labor man-hours, by changing movement of a photosensitive material coated on a base, exposing it, forming a group of patterns different from a mask pattern on the base, and enabling connection of conductive parts in a chip. CONSTITUTION:A mask base 6 has a light-transmitt...

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Bibliographische Detailangaben
1. Verfasser:	MAJIMA NIWAJI
Format:	Patent
Sprache:	eng
Schlagworte:	APPARATUS SPECIALLY ADAPTED THEREFOR BASIC ELECTRIC ELEMENTS CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS CINEMATOGRAPHY ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR ELECTRICITY ELECTROGRAPHY HOLOGRAPHY MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS MATERIALS THEREFOR ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS PRINTED CIRCUITS SEMICONDUCTOR DEVICES
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Beschreibung
Zusammenfassung:	PURPOSE:To save manufacture labor man-hours, by changing movement of a photosensitive material coated on a base, exposing it, forming a group of patterns different from a mask pattern on the base, and enabling connection of conductive parts in a chip. CONSTITUTION:A mask base 6 has a light-transmitting part 7, a light-shielding pattern 8, and right and left light-transmitting parts 9, 10. A resist film on the part A of a base 12 corresponding to the part 7 is exposed using this mask reticle, the base 12 is moved by a distance slightly shorter than 1 pitch to expose the part B, and then the base 12 is moved by a distance slightly longer than 1 pitch to expose the part C, thus permitting a memory chip having conductive patterns 16, 17 connected to each other in the chip to be obtained by processing the base 12.