THERMAL TREATMENT EQUIPMENT FOR SHEET-LIKE MATERIAL

PURPOSE:To reduce the necessary time to heat a sheet-form material such as a wafer, and realize a uniform heating, by constituting a blowing apparatus of hot air comprising a transparent cylindrical main body, a tubular heater and a reflection film. CONSTITUTION:A hot air blown from the blowing outl...

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Bibliographische Detailangaben
1. Verfasser: JO HIDETAKA
Format: Patent
Sprache:eng
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Zusammenfassung:PURPOSE:To reduce the necessary time to heat a sheet-form material such as a wafer, and realize a uniform heating, by constituting a blowing apparatus of hot air comprising a transparent cylindrical main body, a tubular heater and a reflection film. CONSTITUTION:A hot air blown from the blowing outlet 36 of a blowing part 32 is generated by sending an N2 gas into a gas-introducing pipe 34 of a cylindrical main body 33. Because an infrared-ray lamp 39 is equipped in a main body 33, the introduced N2 gas is heated at high temperature as a result of contact with a spiral protrusion 40 of long flow path. Corresponding the region of the lamp 39, the outer surface of the main body 33 is coated with a reflection film 41, so that a high temperature caused by the reflected energy is available, and the N2 gas of high temperature is blown against the upper surface of a wafer 12 from the blowing outlet 36. After a thermal treatment, the wafer is taken out by an endless belt and is transferred, then the thermal treatment is continuously performed. Thus the upper and lower surface of the wafer 12 are heated by a heating plate 30 and the hot air blown from a blowing part 32 while the wafer 12 is carried on endless belts 28a and 28b.