METHOD FOR DETECTING CONTAMINATION OF SURFACE OF MOLTEN METAL IN DEPOSITION CHAMBER OF CONTINUOUS VACUUM DEPOSITION APPARATUS

PURPOSE:To correctly detect the contamination level of the surface of a molten metal by measuring the thickness of a metallic film vacuum-deposited on a hoop, the temp. of the molten metal and the opening degree of a shutter and by calculating a coefft. from the measured values. CONSTITUTION:The thi...

Ausführliche Beschreibung

Bibliographische Detailangaben

Hauptverfasser:	MORIYAMA YOSHITERU, TAUCHI KUNIAKI, AIKO TAKUYA, MENDA SHIGEMI, SEKIGUCHI YASUAKI, SUZUKI SHIRO, NAGAMEGURI SEIICHI
Format:	Patent
Sprache:	eng
Schlagworte:	CHEMICAL SURFACE TREATMENT CHEMISTRY COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING MATERIAL WITH METALLIC MATERIAL COATING METALLIC MATERIAL DIFFUSION TREATMENT OF METALLIC MATERIAL INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL METALLURGY SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION
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