METHOD FOR DETECTING CONTAMINATION OF SURFACE OF MOLTEN METAL IN DEPOSITION CHAMBER OF CONTINUOUS VACUUM DEPOSITION APPARATUS

PURPOSE:To correctly detect the contamination level of the surface of a molten metal by measuring the thickness of a metallic film vacuum-deposited on a hoop, the temp. of the molten metal and the opening degree of a shutter and by calculating a coefft. from the measured values. CONSTITUTION:The thi...

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Bibliographische Detailangaben
Hauptverfasser: MORIYAMA YOSHITERU, TAUCHI KUNIAKI, AIKO TAKUYA, MENDA SHIGEMI, SEKIGUCHI YASUAKI, SUZUKI SHIRO, NAGAMEGURI SEIICHI
Format: Patent
Sprache:eng
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Zusammenfassung:PURPOSE:To correctly detect the contamination level of the surface of a molten metal by measuring the thickness of a metallic film vacuum-deposited on a hoop, the temp. of the molten metal and the opening degree of a shutter and by calculating a coefft. from the measured values. CONSTITUTION:The thickness of a metallic film vacuum-deposited on the surface of a hoop 10 introduced into a vacuum deposition chamber 1 is measured at the outlet of the chamber 1. The temp.of a molten metal 11b in the chamber 1 and the opening degree of a shutter are also measured and a coefft. is calculated from the measured values. The contamination level of the surface of the molten metal is detected by making use of the fact that the thickness of the metallic film is proportional to the temp. of the molten metal 11b and the opening degree of the shutter but is reduced when the surface of the molten metal 11b is contaminated.