RESIST COATER FOR ETCHING

PURPOSE:To uniform the film thickness of a resist on a work surface and to improve the resist coating operation by constituting a titled device into the construction consisting in shaking off an excess resist liquid at the timing of pulling up a material to be etched (work) from a resist vessel. CON...

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1. Verfasser: OSANAI TOMONOBU
Format: Patent
Sprache:eng
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Zusammenfassung:PURPOSE:To uniform the film thickness of a resist on a work surface and to improve the resist coating operation by constituting a titled device into the construction consisting in shaking off an excess resist liquid at the timing of pulling up a material to be etched (work) from a resist vessel. CONSTITUTION:Immersion is executed at a uniform speed in a straight inclining part 12 which descends linearly according to the disposing position of guide rollers 4 of a conveying belt 2 and a horizontal moving part 11 which moves horizontally at the time of immersing the above-mentioned work supported by a holder 2 provided to the belt 2. The work 1 is pulled up while the speed is gradually increased in the curved inclining part which ascends at the gradually increasing speed at the time of pulling up the work 1 from the vessel 20 in succession thereto. The excess resist liquid 5 sticking to the surface of the work 1 is shaken off in the process of the pulling up by which the uniformly stuck resist state is obtd.