FORMATION OF FINE GROOVE

PURPOSE:To accurately obtain a fine groove having an ideal semicircular cross- section by forming a plated layer on the surface of a base material before coating with a resist and by carrying out etching. CONSTITUTION:A plated layer 5 of Ni or the like is formed on the surface of a base material 1 t...

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Bibliographische Detailangaben
Hauptverfasser:	OSANAI TOMONOBU, GOTO TAKASHI
Format:	Patent
Sprache:	eng
Schlagworte:	CHEMICAL SURFACE TREATMENT CHEMISTRY COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING MATERIAL WITH METALLIC MATERIAL COATING METALLIC MATERIAL CORRECTION OF TYPOGRAPHICAL ERRORS DIFFUSION TREATMENT OF METALLIC MATERIAL i.e. MECHANISMS PRINTING OTHERWISE THAN FROM A FORME INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL LINING MACHINES METALLURGY MULTI-STEP PROCESSES FOR SURFACE TREATMENT OF METALLICMATERIAL INVOLVING AT LEAST ONE PROCESS PROVIDED FOR IN CLASSC23 AND AT LEAST ONEPROCESS COVERED BY SUBCLASS C21D OR C22F OR CLASS C25 NON-MECHANICAL REMOVAL OF METALLIC MATERIAL FROM SURFACE PERFORMING OPERATIONS PRINTING SELECTIVE PRINTING MECHANISMS STAMPS TRANSPORTING TYPEWRITERS
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Beschreibung
Zusammenfassung:	PURPOSE:To accurately obtain a fine groove having an ideal semicircular cross- section by forming a plated layer on the surface of a base material before coating with a resist and by carrying out etching. CONSTITUTION:A plated layer 5 of Ni or the like is formed on the surface of a base material 1 to be etched to form a fine nozzle groove 7. The plated layer 5 is coated with a resist 2, a film 6 for forming the groove 7 is placed on the resist 2 and an etching groove 2a is formed by exposure and development. An etching soln. 4 is fed to the groove 2a in the direction of an arrow to form a nozzle groove 7 in the plated layer 5 an the base material 1. By the action of the plated layer 5, the width of side etching D is reduced to about 1/2 of the depth H of the groove 7 and the occurrence of an excessive side etching phenomenon is inhibited, so the groove 7 has a nearly ideal semicircular cross-section.