APPARATUS FOR CONTROLLING AMOUNT OF METALLIC VAPOR DEPOSITED IN VACUUM DEPOSITION APPARATUS

PURPOSE:To improve the yield of products by placing a computer so as to calculate set values for the electric power of a main heater and the degree of opening of a shutter and by inputting the values in respective regulators so as to stabilize the operation of a line in an early stage. CONSTITUTION:...

Ausführliche Beschreibung

Bibliographische Detailangaben

Hauptverfasser:	MORIYAMA YOSHITERU, FURUKAWA HEIZABURO, KATO MITSUO, TAUCHI KUNIAKI, ITO TAKEHIKO, AIKO TAKUYA, MENDA SHIGEMI, OHASHI KYOSUKE, SEKIGUCHI YASUAKI, HANADA TOSHIAKI
Format:	Patent
Sprache:	eng
Schlagworte:	CHEMICAL SURFACE TREATMENT CHEMISTRY COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING MATERIAL WITH METALLIC MATERIAL COATING METALLIC MATERIAL DIFFUSION TREATMENT OF METALLIC MATERIAL INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL METALLURGY SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION
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