APPARATUS FOR CONTROLLING AMOUNT OF METALLIC VAPOR DEPOSITED IN VACUUM DEPOSITION APPARATUS
PURPOSE:To improve the yield of products by placing a computer so as to calculate set values for the electric power of a main heater and the degree of opening of a shutter and by inputting the values in respective regulators so as to stabilize the operation of a line in an early stage. CONSTITUTION:...
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Format: | Patent |
Sprache: | eng |
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Zusammenfassung: | PURPOSE:To improve the yield of products by placing a computer so as to calculate set values for the electric power of a main heater and the degree of opening of a shutter and by inputting the values in respective regulators so as to stabilize the operation of a line in an early stage. CONSTITUTION:This apparatus for controlling the amount of metallic vapor deposited has a computer 27 placed in a system for controlling the electric power of a main heater 9, the degree of opening of a shutter 11, the internal pressure of a vacuum deposition chamber 3 and the position of a plate 15 for controlling the thickness distribution of a film. Instruction data on a steel strip 1 are inputted in the computer 27 and the resulting set signals are inputted in respective controllers. The electric power of the main heater and the degree of opening of the shutter are controlled to control the amount of metallic vapor deposited on the steel strip in the longitudinal and lateral directions. |
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