PRODUCTION OF DIAMOND SEMICONDUCTOR
PURPOSE:To obtain the titled semiconductor extremely useful as an electronic element material, having improved thermal conductivity, etc., by reacting a mixed gas of an oxygen-containing compound containing O, C and H and a dopant and precipitating. CONSTITUTION:A reaction tube 9 is packed with diam...
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creator | KAWACHI SUSUMU NAKAMURA KATSUYUKI |
description | PURPOSE:To obtain the titled semiconductor extremely useful as an electronic element material, having improved thermal conductivity, etc., by reacting a mixed gas of an oxygen-containing compound containing O, C and H and a dopant and precipitating. CONSTITUTION:A reaction tube 9 is packed with diamond or a material 12 except the diamond, valves 6-8 are closed and the reaction tube is exhausted to |
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fullrecord | <record><control><sourceid>epo_EVB</sourceid><recordid>TN_cdi_epo_espacenet_JPS62223095A</recordid><sourceformat>XML</sourceformat><sourcesystem>PC</sourcesystem><sourcerecordid>JPS62223095A</sourcerecordid><originalsourceid>FETCH-epo_espacenet_JPS62223095A3</originalsourceid><addsrcrecordid>eNrjZFAOCPJ3CXUO8fT3U_B3U3DxdPT193NRCHb19XQGMoAy_kE8DKxpiTnFqbxQmptB0c01xNlDN7UgPz61uCAxOTUvtSTeKyDYzMjIyNjA0tTRmBg1AHSpIzM</addsrcrecordid><sourcetype>Open Access Repository</sourcetype><iscdi>true</iscdi><recordtype>patent</recordtype></control><display><type>patent</type><title>PRODUCTION OF DIAMOND SEMICONDUCTOR</title><source>esp@cenet</source><creator>KAWACHI SUSUMU ; NAKAMURA KATSUYUKI</creator><creatorcontrib>KAWACHI SUSUMU ; NAKAMURA KATSUYUKI</creatorcontrib><description>PURPOSE:To obtain the titled semiconductor extremely useful as an electronic element material, having improved thermal conductivity, etc., by reacting a mixed gas of an oxygen-containing compound containing O, C and H and a dopant and precipitating. CONSTITUTION:A reaction tube 9 is packed with diamond or a material 12 except the diamond, valves 6-8 are closed and the reaction tube is exhausted to <=about 10<-4>Torr by a high vacuum exhaust device 14. The valves 6 and 8 are opened. As a given amount of a H2 gas as a carrier gas is sent from a carrier gas feeder 1, a given amount of an oxygen-containing compound such as butanol, etc., containing O, C and H as a carbon source is fed from an oxygen-containing compound feeder 2 to the reaction tube. Microwave having given output is sent from a microwave oscillator 11 to the reaction tube and plasma is generated in the reaction tube 9 while controlling gas pressure at given pressure. The valve 7 is successively opened, a given amount of a dopant such as B2H6, etc. is fed from a dopant feeder to the reaction tube, temperature of the substrate 12 is measured by a thermocouple 13, a mixed gas is reacted at a given temperature for a fixed time and the titled semiconductor is precipitated from the gaseous phase on the substrate 12 and grown.</description><language>eng</language><subject>AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUSPOLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE ; APPARATUS THEREFOR ; BASIC ELECTRIC ELEMENTS ; CHEMISTRY ; CRYSTAL GROWTH ; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ; ELECTRICITY ; METALLURGY ; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITHDEFINED STRUCTURE ; REFINING BY ZONE-MELTING OF MATERIAL ; SEMICONDUCTOR DEVICES ; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITHDEFINED STRUCTURE ; SINGLE-CRYSTAL-GROWTH ; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL ORUNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL</subject><creationdate>1987</creationdate><oa>free_for_read</oa><woscitedreferencessubscribed>false</woscitedreferencessubscribed></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><linktohtml>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=19871001&DB=EPODOC&CC=JP&NR=S62223095A$$EHTML$$P50$$Gepo$$Hfree_for_read</linktohtml><link.rule.ids>230,308,776,881,25542,76289</link.rule.ids><linktorsrc>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=19871001&DB=EPODOC&CC=JP&NR=S62223095A$$EView_record_in_European_Patent_Office$$FView_record_in_$$GEuropean_Patent_Office$$Hfree_for_read</linktorsrc></links><search><creatorcontrib>KAWACHI SUSUMU</creatorcontrib><creatorcontrib>NAKAMURA KATSUYUKI</creatorcontrib><title>PRODUCTION OF DIAMOND SEMICONDUCTOR</title><description>PURPOSE:To obtain the titled semiconductor extremely useful as an electronic element material, having improved thermal conductivity, etc., by reacting a mixed gas of an oxygen-containing compound containing O, C and H and a dopant and precipitating. CONSTITUTION:A reaction tube 9 is packed with diamond or a material 12 except the diamond, valves 6-8 are closed and the reaction tube is exhausted to <=about 10<-4>Torr by a high vacuum exhaust device 14. The valves 6 and 8 are opened. As a given amount of a H2 gas as a carrier gas is sent from a carrier gas feeder 1, a given amount of an oxygen-containing compound such as butanol, etc., containing O, C and H as a carbon source is fed from an oxygen-containing compound feeder 2 to the reaction tube. Microwave having given output is sent from a microwave oscillator 11 to the reaction tube and plasma is generated in the reaction tube 9 while controlling gas pressure at given pressure. The valve 7 is successively opened, a given amount of a dopant such as B2H6, etc. is fed from a dopant feeder to the reaction tube, temperature of the substrate 12 is measured by a thermocouple 13, a mixed gas is reacted at a given temperature for a fixed time and the titled semiconductor is precipitated from the gaseous phase on the substrate 12 and grown.</description><subject>AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUSPOLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE</subject><subject>APPARATUS THEREFOR</subject><subject>BASIC ELECTRIC ELEMENTS</subject><subject>CHEMISTRY</subject><subject>CRYSTAL GROWTH</subject><subject>ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR</subject><subject>ELECTRICITY</subject><subject>METALLURGY</subject><subject>PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITHDEFINED STRUCTURE</subject><subject>REFINING BY ZONE-MELTING OF MATERIAL</subject><subject>SEMICONDUCTOR DEVICES</subject><subject>SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITHDEFINED STRUCTURE</subject><subject>SINGLE-CRYSTAL-GROWTH</subject><subject>UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL ORUNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL</subject><fulltext>true</fulltext><rsrctype>patent</rsrctype><creationdate>1987</creationdate><recordtype>patent</recordtype><sourceid>EVB</sourceid><recordid>eNrjZFAOCPJ3CXUO8fT3U_B3U3DxdPT193NRCHb19XQGMoAy_kE8DKxpiTnFqbxQmptB0c01xNlDN7UgPz61uCAxOTUvtSTeKyDYzMjIyNjA0tTRmBg1AHSpIzM</recordid><startdate>19871001</startdate><enddate>19871001</enddate><creator>KAWACHI SUSUMU</creator><creator>NAKAMURA KATSUYUKI</creator><scope>EVB</scope></search><sort><creationdate>19871001</creationdate><title>PRODUCTION OF DIAMOND SEMICONDUCTOR</title><author>KAWACHI SUSUMU ; NAKAMURA KATSUYUKI</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-epo_espacenet_JPS62223095A3</frbrgroupid><rsrctype>patents</rsrctype><prefilter>patents</prefilter><language>eng</language><creationdate>1987</creationdate><topic>AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUSPOLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE</topic><topic>APPARATUS THEREFOR</topic><topic>BASIC ELECTRIC ELEMENTS</topic><topic>CHEMISTRY</topic><topic>CRYSTAL GROWTH</topic><topic>ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR</topic><topic>ELECTRICITY</topic><topic>METALLURGY</topic><topic>PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITHDEFINED STRUCTURE</topic><topic>REFINING BY ZONE-MELTING OF MATERIAL</topic><topic>SEMICONDUCTOR DEVICES</topic><topic>SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITHDEFINED STRUCTURE</topic><topic>SINGLE-CRYSTAL-GROWTH</topic><topic>UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL ORUNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL</topic><toplevel>online_resources</toplevel><creatorcontrib>KAWACHI SUSUMU</creatorcontrib><creatorcontrib>NAKAMURA KATSUYUKI</creatorcontrib><collection>esp@cenet</collection></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext_linktorsrc</fulltext></delivery><addata><au>KAWACHI SUSUMU</au><au>NAKAMURA KATSUYUKI</au><format>patent</format><genre>patent</genre><ristype>GEN</ristype><title>PRODUCTION OF DIAMOND SEMICONDUCTOR</title><date>1987-10-01</date><risdate>1987</risdate><abstract>PURPOSE:To obtain the titled semiconductor extremely useful as an electronic element material, having improved thermal conductivity, etc., by reacting a mixed gas of an oxygen-containing compound containing O, C and H and a dopant and precipitating. CONSTITUTION:A reaction tube 9 is packed with diamond or a material 12 except the diamond, valves 6-8 are closed and the reaction tube is exhausted to <=about 10<-4>Torr by a high vacuum exhaust device 14. The valves 6 and 8 are opened. As a given amount of a H2 gas as a carrier gas is sent from a carrier gas feeder 1, a given amount of an oxygen-containing compound such as butanol, etc., containing O, C and H as a carbon source is fed from an oxygen-containing compound feeder 2 to the reaction tube. Microwave having given output is sent from a microwave oscillator 11 to the reaction tube and plasma is generated in the reaction tube 9 while controlling gas pressure at given pressure. The valve 7 is successively opened, a given amount of a dopant such as B2H6, etc. is fed from a dopant feeder to the reaction tube, temperature of the substrate 12 is measured by a thermocouple 13, a mixed gas is reacted at a given temperature for a fixed time and the titled semiconductor is precipitated from the gaseous phase on the substrate 12 and grown.</abstract><oa>free_for_read</oa></addata></record> |
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subjects | AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUSPOLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE APPARATUS THEREFOR BASIC ELECTRIC ELEMENTS CHEMISTRY CRYSTAL GROWTH ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY METALLURGY PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITHDEFINED STRUCTURE REFINING BY ZONE-MELTING OF MATERIAL SEMICONDUCTOR DEVICES SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITHDEFINED STRUCTURE SINGLE-CRYSTAL-GROWTH UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL ORUNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL |
title | PRODUCTION OF DIAMOND SEMICONDUCTOR |
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