ELECTRON BEAM EXPOSING DEVICE

PURPOSE:To perform an exposing process accurately by a method wherein the spot-size information given to a refocus coil is given to an auxiliary deflector too, and the lateral shifting generating by the area difference of the beam formed by the mounting error of a refocus coil is corrected for every...

Ausführliche Beschreibung

Bibliographische Detailangaben

1. Verfasser:	MIYAGI SHINJI
Format:	Patent
Sprache:	eng
Schlagworte:	BASIC ELECTRIC ELEMENTS ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY SEMICONDUCTOR DEVICES
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