ELECTRON BEAM EXPOSING DEVICE

PURPOSE:To perform an exposing process accurately by a method wherein the spot-size information given to a refocus coil is given to an auxiliary deflector too, and the lateral shifting generating by the area difference of the beam formed by the mounting error of a refocus coil is corrected for every sub-field shot. CONSTITUTION:A field correction memory 26 is made access by the information X and Y to be given to the X and Y axes of the main deflector 23 from a pattern mem ory 27. The voltage adjustment constants gx and gy added to an auxiliary deflector 24, the rotating angle adjustment constants rx and ry based on the shifting of adjust ment position, and the correction constants hx and hy of spot-size informations lx and ly are taken out. On the other hand, the informations (x) and (y) added to the auxiliary deflector 24 from the pattern memory 27 and the spot-size informations lx and ly are taken out, they are D/A-converted 27 and amplified by arithmetic opera tion, and the obtained value is given to the auxiliary deflector 24 and a correcting operation is performed. To be more precise, the corrected size information hxlxly and hylxly of the quantity same as that added to a focus coil 19 is given to the auxilia ry deflector 24, and the lateral shifting based on the mounting error of a refocus coil 19 can be restored.