DEVICE FOR VAPOR GROWTH OF SEMICONDUCTOR THIN FILM

DEVICE FOR VAPOR GROWTH OF SEMICONDUCTOR THIN FILM

PURPOSE:To restrain a curl-up of a gas by making a flow of the gas in a reactor tube uniform by providing a shielding cylinder with through-holes of twice number as that of exhaust vents so as to divide the gas for exhaust. CONSTITUTION:A shielding cylinder 15 is provided with through-holes of twice...

Ausführliche Beschreibung

Gespeichert in:
Bibliographische Detailangaben
Hauptverfasser: KOJIMA SEIJI, IKEDA MASAKIYO, KASHIYANAGI YUZO
Format: Patent
Sprache:eng
Schlagworte:
BASIC ELECTRIC ELEMENTS
ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR
ELECTRICITY
SEMICONDUCTOR DEVICES
Online-Zugang:Volltext bestellen
Tags: Tag hinzufügen
Keine Tags, Fügen Sie den ersten Tag hinzu!
container_end_page
container_issue
container_start_page
container_title
container_volume
creator KOJIMA SEIJI
IKEDA MASAKIYO
KASHIYANAGI YUZO
description PURPOSE:To restrain a curl-up of a gas by making a flow of the gas in a reactor tube uniform by providing a shielding cylinder with through-holes of twice number as that of exhaust vents so as to divide the gas for exhaust. CONSTITUTION:A shielding cylinder 15 is provided with through-holes of twice number as that of exhaust vents 6 and which have roughly the same diameter as an inner diameter of the exhaust vents 6. A gas is divided to be exhausted from the through-holes 15a of the shielding cylinder 15 and this is equivalent to that the exhaust vents becomes twice and accordingly, a flow of the gas becomes uniform. As a result, a curl-up of the gas in the part where a gas velocity is slow is restrained.
format Patent
fullrecord <record><control><sourceid>epo_EVB</sourceid><recordid>TN_cdi_epo_espacenet_JPS62211914A</recordid><sourceformat>XML</sourceformat><sourcesystem>PC</sourcesystem><sourcerecordid>JPS62211914A</sourcerecordid><originalsourceid>FETCH-epo_espacenet_JPS62211914A3</originalsourceid><addsrcrecordid>eNrjZDBycQ3zdHZVcPMPUghzDACS7kH-4SEeCv5uCsGuvp7O_n4uoc4hQPEQD08_BTdPH18eBta0xJziVF4ozc2g6OYa4uyhm1qQH59aXJCYnJqXWhLvFRBsZmRkaGhpaOJoTIwaAHmQJw4</addsrcrecordid><sourcetype>Open Access Repository</sourcetype><iscdi>true</iscdi><recordtype>patent</recordtype></control><display><type>patent</type><title>DEVICE FOR VAPOR GROWTH OF SEMICONDUCTOR THIN FILM</title><source>esp@cenet</source><creator>KOJIMA SEIJI ; IKEDA MASAKIYO ; KASHIYANAGI YUZO</creator><creatorcontrib>KOJIMA SEIJI ; IKEDA MASAKIYO ; KASHIYANAGI YUZO</creatorcontrib><description>PURPOSE:To restrain a curl-up of a gas by making a flow of the gas in a reactor tube uniform by providing a shielding cylinder with through-holes of twice number as that of exhaust vents so as to divide the gas for exhaust. CONSTITUTION:A shielding cylinder 15 is provided with through-holes of twice number as that of exhaust vents 6 and which have roughly the same diameter as an inner diameter of the exhaust vents 6. A gas is divided to be exhausted from the through-holes 15a of the shielding cylinder 15 and this is equivalent to that the exhaust vents becomes twice and accordingly, a flow of the gas becomes uniform. As a result, a curl-up of the gas in the part where a gas velocity is slow is restrained.</description><language>eng</language><subject>BASIC ELECTRIC ELEMENTS ; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ; ELECTRICITY ; SEMICONDUCTOR DEVICES</subject><creationdate>1987</creationdate><oa>free_for_read</oa><woscitedreferencessubscribed>false</woscitedreferencessubscribed></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><linktohtml>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&amp;date=19870917&amp;DB=EPODOC&amp;CC=JP&amp;NR=S62211914A$$EHTML$$P50$$Gepo$$Hfree_for_read</linktohtml><link.rule.ids>230,308,776,881,25542,76289</link.rule.ids><linktorsrc>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&amp;date=19870917&amp;DB=EPODOC&amp;CC=JP&amp;NR=S62211914A$$EView_record_in_European_Patent_Office$$FView_record_in_$$GEuropean_Patent_Office$$Hfree_for_read</linktorsrc></links><search><creatorcontrib>KOJIMA SEIJI</creatorcontrib><creatorcontrib>IKEDA MASAKIYO</creatorcontrib><creatorcontrib>KASHIYANAGI YUZO</creatorcontrib><title>DEVICE FOR VAPOR GROWTH OF SEMICONDUCTOR THIN FILM</title><description>PURPOSE:To restrain a curl-up of a gas by making a flow of the gas in a reactor tube uniform by providing a shielding cylinder with through-holes of twice number as that of exhaust vents so as to divide the gas for exhaust. CONSTITUTION:A shielding cylinder 15 is provided with through-holes of twice number as that of exhaust vents 6 and which have roughly the same diameter as an inner diameter of the exhaust vents 6. A gas is divided to be exhausted from the through-holes 15a of the shielding cylinder 15 and this is equivalent to that the exhaust vents becomes twice and accordingly, a flow of the gas becomes uniform. As a result, a curl-up of the gas in the part where a gas velocity is slow is restrained.</description><subject>BASIC ELECTRIC ELEMENTS</subject><subject>ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR</subject><subject>ELECTRICITY</subject><subject>SEMICONDUCTOR DEVICES</subject><fulltext>true</fulltext><rsrctype>patent</rsrctype><creationdate>1987</creationdate><recordtype>patent</recordtype><sourceid>EVB</sourceid><recordid>eNrjZDBycQ3zdHZVcPMPUghzDACS7kH-4SEeCv5uCsGuvp7O_n4uoc4hQPEQD08_BTdPH18eBta0xJziVF4ozc2g6OYa4uyhm1qQH59aXJCYnJqXWhLvFRBsZmRkaGhpaOJoTIwaAHmQJw4</recordid><startdate>19870917</startdate><enddate>19870917</enddate><creator>KOJIMA SEIJI</creator><creator>IKEDA MASAKIYO</creator><creator>KASHIYANAGI YUZO</creator><scope>EVB</scope></search><sort><creationdate>19870917</creationdate><title>DEVICE FOR VAPOR GROWTH OF SEMICONDUCTOR THIN FILM</title><author>KOJIMA SEIJI ; IKEDA MASAKIYO ; KASHIYANAGI YUZO</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-epo_espacenet_JPS62211914A3</frbrgroupid><rsrctype>patents</rsrctype><prefilter>patents</prefilter><language>eng</language><creationdate>1987</creationdate><topic>BASIC ELECTRIC ELEMENTS</topic><topic>ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR</topic><topic>ELECTRICITY</topic><topic>SEMICONDUCTOR DEVICES</topic><toplevel>online_resources</toplevel><creatorcontrib>KOJIMA SEIJI</creatorcontrib><creatorcontrib>IKEDA MASAKIYO</creatorcontrib><creatorcontrib>KASHIYANAGI YUZO</creatorcontrib><collection>esp@cenet</collection></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext_linktorsrc</fulltext></delivery><addata><au>KOJIMA SEIJI</au><au>IKEDA MASAKIYO</au><au>KASHIYANAGI YUZO</au><format>patent</format><genre>patent</genre><ristype>GEN</ristype><title>DEVICE FOR VAPOR GROWTH OF SEMICONDUCTOR THIN FILM</title><date>1987-09-17</date><risdate>1987</risdate><abstract>PURPOSE:To restrain a curl-up of a gas by making a flow of the gas in a reactor tube uniform by providing a shielding cylinder with through-holes of twice number as that of exhaust vents so as to divide the gas for exhaust. CONSTITUTION:A shielding cylinder 15 is provided with through-holes of twice number as that of exhaust vents 6 and which have roughly the same diameter as an inner diameter of the exhaust vents 6. A gas is divided to be exhausted from the through-holes 15a of the shielding cylinder 15 and this is equivalent to that the exhaust vents becomes twice and accordingly, a flow of the gas becomes uniform. As a result, a curl-up of the gas in the part where a gas velocity is slow is restrained.</abstract><oa>free_for_read</oa></addata></record>
fulltext fulltext_linktorsrc
identifier
ispartof
issn
language eng
recordid cdi_epo_espacenet_JPS62211914A
source esp@cenet
subjects BASIC ELECTRIC ELEMENTS
ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR
ELECTRICITY
SEMICONDUCTOR DEVICES
title DEVICE FOR VAPOR GROWTH OF SEMICONDUCTOR THIN FILM
url https://sfx.bib-bvb.de/sfx_tum?ctx_ver=Z39.88-2004&ctx_enc=info:ofi/enc:UTF-8&ctx_tim=2025-02-04T22%3A53%3A52IST&url_ver=Z39.88-2004&url_ctx_fmt=infofi/fmt:kev:mtx:ctx&rfr_id=info:sid/primo.exlibrisgroup.com:primo3-Article-epo_EVB&rft_val_fmt=info:ofi/fmt:kev:mtx:patent&rft.genre=patent&rft.au=KOJIMA%20SEIJI&rft.date=1987-09-17&rft_id=info:doi/&rft_dat=%3Cepo_EVB%3EJPS62211914A%3C/epo_EVB%3E%3Curl%3E%3C/url%3E&disable_directlink=true&sfx.directlink=off&sfx.report_link=0&rft_id=info:oai/&rft_id=info:pmid/&rfr_iscdi=true