HEATING DEVICE FOR THERMAL CONDUCTIVITY DETECTOR

PURPOSE:To increase the upper limit of restriction of a current, by to obtain a detector (TCD) of gas chromatography of a high sensitivity, by improving the thermal conductivity of a heating part. CONSTITUTION:On a surface azimuth property silicon wafer 3, Pyrex glass 4 is provided by spattering, th...

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Bibliographische Detailangaben
Hauptverfasser: HAGIWARA SHIYOUSUKE, SUENOBU KAZUHIKO
Format: Patent
Sprache:eng
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Zusammenfassung:PURPOSE:To increase the upper limit of restriction of a current, by to obtain a detector (TCD) of gas chromatography of a high sensitivity, by improving the thermal conductivity of a heating part. CONSTITUTION:On a surface azimuth property silicon wafer 3, Pyrex glass 4 is provided by spattering, the bottom face 3a of the wafer 3 is finished by executing anisotropic etching by an EPW method, the surface of the Pyrex glass is coated with a nickel thin film by a vapor-depositing method, and thereafter, a heating part 1 of TCD is formed on the Pyrex glass 4. Also, one or plural pieces of fins 2 being a current application increase means to the heating part 1 are provided obliquely by providing a right angle or some angle against the heating part 1. The TCD provided with this heating part 1 is welded by pressure through a joining member to a silicon wafer capillary column 5, and a component of gas, etc., flowing in the capillary column 5 is analyzed and detected. When an area of the fin 2 is formed to the same area as that of the heating part 1, a heating value for heating can be added by two times.