INLINE TYPE FILM FORMING DEVICE

PURPOSE:To make substantial and efficient degassing of substrates which release much gas and to improve the productivity of the titled device by directing the plate surfaces of the substrates toward the front and subjecting the substrates to degassing while conveying the same in a degassing chamber...

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1. Verfasser: SUWA HIDENORI
Format: Patent
Sprache:eng
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Beschreibung
Zusammenfassung:PURPOSE:To make substantial and efficient degassing of substrates which release much gas and to improve the productivity of the titled device by directing the plate surfaces of the substrates toward the front and subjecting the substrates to degassing while conveying the same in a degassing chamber successively provided perpendicularly to a charging chamber and film forming chamber for the substrates. CONSTITUTION:The untreated substrates 1 are fed into the charging chamber 2 and after the inside of the chamber is maintained in a vacuum state, the substrates in a horizontal state are fed into the degassing chamber 6 successively provided perpendicularly above and below to the charging chamber 2. The substrates 1 of which the plate surfaces are directed forward are successively conveyed by a conveyor such as endless belt conveyor in said chamber and further, the substrates are subjected to the substantial degassing by evacuating the inside of the chamber at a high speed by a large-capacity vacuum pump (not shown) connected to a discharge port 13. The substrates 1 are thereafter carried horizontally through a slit 10 into the film forming chamber 7 provided with a spattering cathode 8 where the films are formed on the surfaces thereof. The substrates 1 on which the films are formed are taken out into the external air via a taking out chamber 11 having sluice valves 12, 15 and are transferred by vertical and horizontal return conveyors 14, 17 to a station 16.