PHOTORESIST COMPOSITION

PURPOSE:To improve the heat resistance, sensitivity and resolution of a film by using high mol.wt. alkyl substituted phenol novolak resin having >=1,500 number average mol.wt. measured by a vapor pressure method using dimethylacetamide as a solvent as a component of a resist. CONSTITUTION:This ph...

Ausführliche Beschreibung

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Bibliographische Detailangaben
Hauptverfasser:	NAKANO YOSHIKAZU, KADA MASUMI
Format:	Patent
Sprache:	eng
Schlagworte:	ADHESIVES APPARATUS SPECIALLY ADAPTED THEREFOR AUXILIARY PROCESSES IN PHOTOGRAPHY CHEMISTRY CINEMATOGRAPHY COMPOSITIONS BASED THEREON COMPOSITIONS OF MACROMOLECULAR COMPOUNDS DYES ELECTROGRAPHY HOLOGRAPHY MATERIALS FOR MISCELLANEOUS APPLICATIONS, NOT PROVIDED FORELSEWHERE MATERIALS THEREFOR METALLURGY MISCELLANEOUS APPLICATIONS OF MATERIALS MISCELLANEOUS COMPOSITIONS NATURAL RESINS ORGANIC MACROMOLECULAR COMPOUNDS ORIGINALS THEREFOR PAINTS PHOTOGRAPHIC PROCESSES, e.g. CINE, X-RAY, COLOUR,STEREO-PHOTOGRAPHIC PROCESSES PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHOTOSENSITIVE MATERIALS FOR PHOTOGRAPHIC PURPOSES PHYSICS POLISHES THEIR PREPARATION OR CHEMICAL WORKING-UP USE OF INORGANIC OR NON-MACROMOLECULAR ORGANIC SUBSTANCES ASCOMPOUNDING INGREDIENTS
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Beschreibung
Zusammenfassung:	PURPOSE:To improve the heat resistance, sensitivity and resolution of a film by using high mol.wt. alkyl substituted phenol novolak resin having >=1,500 number average mol.wt. measured by a vapor pressure method using dimethylacetamide as a solvent as a component of a resist. CONSTITUTION:This photoresist composition consists of 50-99pts.wt. high mol.wt. alkyl substituted phenol novolak resin (A) having >=1,500 number average mol.wt. measured by a vapor pressure method using dimethylacetamide as a solvent and 1-50pts.wt. positive diazo sensitizer (B). The resin A has alternately bonded phenol groups each having 1-9C alkyl groups as substituents at the o- or p-positions and methylene groups. Higher contrast is obtd. by reducing the ratio between the weight average mol.wt. of the resin A and the number average mol.wt. (degree of dispersion) and the preferred ratio is