POSITIVE TYPE PHOTORESIST COMPOSITION

PURPOSE:To improve the anti-dryetching property of the titled composition by compounding a quinone diazide compd. and a cresol-formaldehyde novolak resin having a prescribed condition in a ratio of 1:(4-7). CONSTITUTION:The cresol-formalde novolak resin which is a relatively high polymer and has a w...

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Bibliographische Detailangaben
Hauptverfasser:	KONISHI SHINJI, HANABATAKE MAKOTO, FURUTA AKIHIRO, KURATA NOBUYUKI, HORIKAWA YASUHIKO
Format:	Patent
Sprache:	eng
Schlagworte:	APPARATUS SPECIALLY ADAPTED THEREFOR AUXILIARY PROCESSES IN PHOTOGRAPHY CHEMISTRY CINEMATOGRAPHY COMPOSITIONS BASED THEREON COMPOSITIONS OF MACROMOLECULAR COMPOUNDS ELECTROGRAPHY HOLOGRAPHY MATERIALS THEREFOR METALLURGY ORGANIC MACROMOLECULAR COMPOUNDS ORIGINALS THEREFOR PHOTOGRAPHIC PROCESSES, e.g. CINE, X-RAY, COLOUR,STEREO-PHOTOGRAPHIC PROCESSES PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHOTOSENSITIVE MATERIALS FOR PHOTOGRAPHIC PURPOSES PHYSICS THEIR PREPARATION OR CHEMICAL WORKING-UP USE OF INORGANIC OR NON-MACROMOLECULAR ORGANIC SUBSTANCES ASCOMPOUNDING INGREDIENTS
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Beschreibung
Zusammenfassung:	PURPOSE:To improve the anti-dryetching property of the titled composition by compounding a quinone diazide compd. and a cresol-formaldehyde novolak resin having a prescribed condition in a ratio of 1:(4-7). CONSTITUTION:The cresol-formalde novolak resin which is a relatively high polymer and has a weight average molecular weight of 10,000-25,000 is obtd. by using an acidic catalyst from a starting material of m, p mixed cresols having a compounding ratio of m-cresol/p-cresol of 50/50-80/20. The compounding ratio of the quinone diazide compd. and the cresol formaldehyde novolak resin is a specific range of 1:(4-7). Thus, the titled composition having the excellent heat-resisting and anti-dryetching properties, maintaining the high sensitivity is obtd.