ELECTRON BEAM IMAGE DRAWING METHOD AND IMAGE DRAWING EQUIPMENT

PURPOSE:To decrease the total number of beam scannings, and improve the through put of image drawing, by performing the image drawing of a pattern with a beam of rather large diameter matched to each pattern size, in the manner in which the dimension of the beam is adjusted in the electron beam image drawing of raster scan system. CONSTITUTION:When fraction data patterns 52 (shown by solid line shading which are not the integral multiple of the diameter of fixed standard beam) and integer data patterns 53 (shown by broken line shading) exist together, these are divided into separate chips in the stage of data preparation. That is, for example, a chip A to be drawn with a thin beam being not the integral multiple, and a chip B which can be drawn even with a thick beam being an integral multiple. An arrangement information where any chip should be drawn is specified, the beam diameter and other conditions of an electron beam image drawing equipment are set, and an image drawing is performed as to one of the divided chips. As to a second chip, it is performed in the same manner as the above first chip, and thus the image drawing of all chips is finished.