MANUFACTURE OF HIGH MOLECULAR SUBSTRATE HAVING FLOW CHANNEL

PURPOSE:To enable a high molecular substrate having a complicated ad micro flow channel pattern to be formed by forming a pattern of photomask using a flow channel pattern molding die. CONSTITUTION:A resist layer is applied or stuck in a thickness corresponding to the depth of a flow channel groove...

Ausführliche Beschreibung

Bibliographische Detailangaben

Hauptverfasser:	KANAI MASAO, KIMURA SATOYOSHI, ASAI KOSUKE
Format:	Patent
Sprache:	eng
Schlagworte:	AFTER-TREATMENT OF THE SHAPED PRODUCTS, e.g. REPAIRING CORRECTION OF TYPOGRAPHICAL ERRORS i.e. MECHANISMS PRINTING OTHERWISE THAN FROM A FORME LINING MACHINES PERFORMING OPERATIONS PRINTING SELECTIVE PRINTING MECHANISMS SHAPING OF MATERIAL IN A PLASTIC STATE, NOT OTHERWISE PROVIDEDFOR SHAPING OR JOINING OF PLASTICS STAMPS TRANSPORTING TYPEWRITERS WORKING OF PLASTICS WORKING OF SUBSTANCES IN A PLASTIC STATE, IN GENERAL
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