MANUFACTURE OF HIGH MOLECULAR SUBSTRATE HAVING FLOW CHANNEL

PURPOSE:To enable a high molecular substrate having a complicated ad micro flow channel pattern to be formed by forming a pattern of photomask using a flow channel pattern molding die. CONSTITUTION:A resist layer is applied or stuck in a thickness corresponding to the depth of a flow channel groove...

Ausführliche Beschreibung

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Bibliographische Detailangaben
Hauptverfasser: KANAI MASAO, KIMURA SATOYOSHI, ASAI KOSUKE
Format: Patent
Sprache:eng
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Beschreibung
Zusammenfassung:PURPOSE:To enable a high molecular substrate having a complicated ad micro flow channel pattern to be formed by forming a pattern of photomask using a flow channel pattern molding die. CONSTITUTION:A resist layer is applied or stuck in a thickness corresponding to the depth of a flow channel groove 2 on a base 7 such as a smooth glass sheet. Further a photomask 5 is overlaid on said layer and then is irradiated using an ultraviolet ray. Next, after striping off the photomask 5, the unreacted portion of a photoresist layer 6 is removed with a solvent, thus preparing a master. After this process, the master is coated with a nickel layer approx. 0.1mu thick for electroconduction, and then is covered with a metal film (metal plate) such as nickel using an electroforming technique. Next the master is peeled off the metal plate. A high molecular substrate with a flow channel groove is injection-molded using a partially machined molding die made up of a metal plate 11 and a convex part 10.