JPS616373B

PURPOSE:To form the titled image having high masking properties and high resist removability by irradiating a radiation sensitive material contg. a polymer having an aromatic carboxylic acid derivative repeating unit and a styrene derivative repeating unit in each molecule through a predetermined pa...

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Bibliographische Detailangaben
Hauptverfasser:	NISHIZAWA WAHEI, EGUCHI CHIHIRO
Format:	Patent
Sprache:	eng
Schlagworte:	APPARATUS SPECIALLY ADAPTED THEREFOR AUXILIARY PROCESSES IN PHOTOGRAPHY BASIC ELECTRIC ELEMENTS CHEMISTRY CINEMATOGRAPHY COMPOSITIONS BASED THEREON ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY ELECTROGRAPHY HOLOGRAPHY MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVINGCARBON-TO-CARBON UNSATURATED BONDS MATERIALS THEREFOR METALLURGY ORGANIC MACROMOLECULAR COMPOUNDS ORIGINALS THEREFOR PHOTOGRAPHIC PROCESSES, e.g. CINE, X-RAY, COLOUR,STEREO-PHOTOGRAPHIC PROCESSES PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHOTOSENSITIVE MATERIALS FOR PHOTOGRAPHIC PURPOSES PHYSICS SEMICONDUCTOR DEVICES THEIR PREPARATION OR CHEMICAL WORKING-UP
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Beschreibung
Zusammenfassung:	PURPOSE:To form the titled image having high masking properties and high resist removability by irradiating a radiation sensitive material contg. a polymer having an aromatic carboxylic acid derivative repeating unit and a styrene derivative repeating unit in each molecule through a predetermined pattern followed by development. CONSTITUTION:Radiation is applied to the radiation sensitive layer of a radiation sensitive material, through a predetermined pattern, contg. a polymer having a repeating unit represented by formula I (where R is H or CH3, R is alkylene, R is optionally substituted alkyl or aryl, and Y is H, nitrile or optionally substituted alkyl, aryl, acyl, alkoxycarbonyl or aryloxycarbonyl) and a repeating unit represented by formula II (where R is H or CH3 and R is H, halogen, cyano, alkyl or alkyl halide) in each molecule. The layer is then developed to form a resist image.