PREPARATION OF MEMBRANE

PURPOSE:To form a controlled arbitrary atomic layer or molecular layer structure, in preparing the membrane utilized in an electronic device, by performing the growth of the membrane in the presence of an atomic group, wherein surface energy does not become larger than the energy of a growth surface...

Ausführliche Beschreibung

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Bibliographische Detailangaben
Hauptverfasser:	SUSA KENZO, MATSUYAMA IWAO
Format:	Patent
Sprache:	eng
Schlagworte:	AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUSPOLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE APPARATUS THEREFOR CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOIDCHEMISTRY CHEMICAL SURFACE TREATMENT CHEMISTRY COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING MATERIAL WITH METALLIC MATERIAL COATING METALLIC MATERIAL CRYSTAL GROWTH DIFFUSION TREATMENT OF METALLIC MATERIAL INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL METALLURGY PERFORMING OPERATIONS PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITHDEFINED STRUCTURE REFINING BY ZONE-MELTING OF MATERIAL SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITHDEFINED STRUCTURE SINGLE-CRYSTAL-GROWTH SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION THEIR RELEVANT APPARATUS TRANSPORTING UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL ORUNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL
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Beschreibung
Zusammenfassung:	PURPOSE:To form a controlled arbitrary atomic layer or molecular layer structure, in preparing the membrane utilized in an electronic device, by performing the growth of the membrane in the presence of an atomic group, wherein surface energy does not become larger than the energy of a growth surface, in the membrane growth surface. CONSTITUTION:As third substances C, C', atomic groups or functional groups 3, 3' are chemical bonded to the atom of a growth surface or adsorbed thereby to make it possible to always keep the surface energies sigmaC, sigmaC' of a formed embrane smaller than the energies sigmaA, sigmaB of a substrate. Therefore, even through processes (a), (b), (c), all of films A, B can be always formed only of an arbitrary atomic layer as flat membranes. As a membrane forming stock material, a compound containing a membrane constituting element is pref. used and, as the stock compound, hydride, metal alkoxide or metal carboxide are pref.