SEMICONDUCTOR SUBSTRATE TREATING DEVICE

PURPOSE:To maintain the temperature and pressure distributions during the treatment of a substrate uniform and to readily convey in or out the substrate by heating a container having horizontal racks to the prescribed temperature and driving the cover plate of an exit to close or open it. CONSTITUTI...

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Bibliographische Detailangaben
Hauptverfasser:	IMOTO YUKIO, TAKAHASHI YASUO
Format:	Patent
Sprache:	eng
Schlagworte:	APPARATUS SPECIALLY ADAPTED THEREFOR BASIC ELECTRIC ELEMENTS CINEMATOGRAPHY ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY ELECTROGRAPHY HOLOGRAPHY MATERIALS THEREFOR ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS SEMICONDUCTOR DEVICES
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Beschreibung
Zusammenfassung:	PURPOSE:To maintain the temperature and pressure distributions during the treatment of a substrate uniform and to readily convey in or out the substrate by heating a container having horizontal racks to the prescribed temperature and driving the cover plate of an exit to close or open it. CONSTITUTION:The pitch of slits 5 of a cover plate 4 of a conveying exit of a container 1 is the same as that of racks 2, and the plate 4 is moved upward and downward by a cam 6 in cooperation with the operation of a conveyor. The racks 2 are placed with substrates to be treated, and heated. According to this construction, the temperature and pressure distributions in the container 1 become approximately uniform during the treatment of the substrate to uniformly treat the substrates and to readily convey the substrate in or out.