BETA-KETOESTER OR CYCLIC ACETAL OR CYCLIC KETAL OF BETA-AMIDE, COMPOSITION, IMAGE FORMATION AND PRODUCT THEREFROM

Compounds of formula I (I) in conjunction with compounds that donate acid when exposed to actinic radiation, are suitable for use as positive photoresists. In formula I, R1 and R2 are hydrogen, alkyl, aryl, cycloalkyl, aralkyl or alkaryl, R3 to R8 are hydrogen or lower alkyl, X is -O- or -NR9-, wher...

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Bibliographische Detailangaben
1. Verfasser:	MAACHIN ROOTO
Format:	Patent
Sprache:	eng
Schlagworte:	APPARATUS SPECIALLY ADAPTED THEREFOR AUXILIARY PROCESSES IN PHOTOGRAPHY BASIC ELECTRIC ELEMENTS CHEMISTRY CINEMATOGRAPHY ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY ELECTROGRAPHY HETEROCYCLIC COMPOUNDS HOLOGRAPHY MATERIALS THEREFOR METALLURGY ORGANIC CHEMISTRY ORIGINALS THEREFOR PHOTOGRAPHIC PROCESSES, e.g. CINE, X-RAY, COLOUR,STEREO-PHOTOGRAPHIC PROCESSES PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHOTOSENSITIVE MATERIALS FOR PHOTOGRAPHIC PURPOSES PHYSICS SEMICONDUCTOR DEVICES
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Beschreibung
Zusammenfassung:	Compounds of formula I (I) in conjunction with compounds that donate acid when exposed to actinic radiation, are suitable for use as positive photoresists. In formula I, R1 and R2 are hydrogen, alkyl, aryl, cycloalkyl, aralkyl or alkaryl, R3 to R8 are hydrogen or lower alkyl, X is -O- or -NR9-, where R9 is hydrogen or C1-C4alkyl n is 0 or 1, m is 2, 3 or 4 and Q is an organic radical of valency m. The photoresists are suitable for making printing formes, printed circuits, integrated circuits or silver-free photographic films.