MANUFACTURE OF MASK FOR X-RAY EXPOSURE

PURPOSE:To improve the precision of a mask external form and the size of the mask external form by shaping a plurality of X-ray absorptive patterns onto one surface, forming a reinforcing film onto the surface of an X-ray transmitting thin-film board with a substrate patterned for a support frame on...

Ausführliche Beschreibung

Bibliographische Detailangaben

Hauptverfasser:	IIMURA YUKIO, SANO NAOTAKE
Format:	Patent
Sprache:	eng
Schlagworte:	APPARATUS SPECIALLY ADAPTED THEREFOR BASIC ELECTRIC ELEMENTS CINEMATOGRAPHY ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY ELECTROGRAPHY HOLOGRAPHY MATERIALS THEREFOR ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS SEMICONDUCTOR DEVICES
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