MANUFACTURE OF MASK FOR X-RAY EXPOSURE

PURPOSE:To improve the precision of a mask external form and the size of the mask external form by shaping a plurality of X-ray absorptive patterns onto one surface, forming a reinforcing film onto the surface of an X-ray transmitting thin-film board with a substrate patterned for a support frame on...

Ausführliche Beschreibung

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Bibliographische Detailangaben
Hauptverfasser: IIMURA YUKIO, SANO NAOTAKE
Format: Patent
Sprache:eng
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Beschreibung
Zusammenfassung:PURPOSE:To improve the precision of a mask external form and the size of the mask external form by shaping a plurality of X-ray absorptive patterns onto one surface, forming a reinforcing film onto the surface of an X-ray transmitting thin-film board with a substrate patterned for a support frame on the other surface and cutting and dividing the thin-film board into a plurality of masks for X-ray exposure. CONSTITUTION:An X-ray absorptive pattern 3 is formed on one surface, and a reinforcing film 5 is shaped on the surface on the X-ray absorptive pattern side of an X-ray transmitting thin-film board 2 with a substrate 4' patterned for a support frame 4 on the other surface. A material, which gives a thin-film sufficient strength and can be dissolved and removed in aftertreatment or does not damage the function of a mask 1 for X-ray exposure, is used as the quality of materials of the reinforcing film. The reinforcing film is shaped, and the thin-film board is cut and separated while using reference markers 8 for cutting as marks. Accordingly, the high accuracy of cut end surfaces is acquired, thus improving the relative positional accuracy of a mask external form and the X-ray absorptive pattern.