SEPARATION OF GALLIUM FROM AQUEOUS SOLUTION OF ALUMINATE

PURPOSE:To enable the effective separation of Ga and the repeated use of a chelate resin, by contacting an aqueous solution of Ga-containing aluminate with a chelate resin having a specific functional group. CONSTITUTION:The chelate resin used in the present process is a resin containing a divinylbe...

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Bibliographische Detailangaben
Hauptverfasser:	IMACHI TOMIO, MORIYA MASAFUMI
Format:	Patent
Sprache:	eng
Schlagworte:	CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOIDCHEMISTRY CHEMISTRY COMPOUNDS CONTAINING METALS NOT COVERED BY SUBCLASSESC01D OR C01F COMPOUNDS OF THE METALS BERYLLIUM, MAGNESIUM, ALUMINIUM,CALCIUM, STRONTIUM, BARIUM, RADIUM, THORIUM, OR OF THERARE-EARTH METALS INORGANIC CHEMISTRY METALLURGY PERFORMING OPERATIONS PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL THEIR RELEVANT APPARATUS TRANSPORTING
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Beschreibung
Zusammenfassung:	PURPOSE:To enable the effective separation of Ga and the repeated use of a chelate resin, by contacting an aqueous solution of Ga-containing aluminate with a chelate resin having a specific functional group. CONSTITUTION:The chelate resin used in the present process is a resin containing a divinylbenzene copolymer, an epoxy resin, a phenolic resin, a resorcinol resin or a vinyl chloride resin as the base resin, and having one or more groups selected from aminoalkylenephosphoric acid group, iminoalkylenephosphoric acid group, alkylenephosphoric acid group and their salt as functional groups. The chelate resin is made to contact with an aqueous solution of Ga-containing aluminate produced in the production of alumina to effect the adsorption of Ga from the aqueous solution to the chelate resin. The adsorbed Ga can be recovered easily by treating the Ga-containing chelate resin with a strong acid. Since the chelate resin has excellent acid resistance and alkali resistance, it can be reused repeatedly.