PRODUCTION OF RESIN FOR MOLDING MATERIAL OF OPTICAL DISK SUBSTRATE

PURPOSE:To obtain the titled resin having high heat resistance, high hardness and low water absorption, by radically polymerizing an acrylic compound having a specific structural formula. CONSTITUTION:Preferably 0.01-0.1pts.wt. radical initiator, e.g. benzoyl peroxide, is added to a compound express...

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Bibliographische Detailangaben
Hauptverfasser: ARITOMI MITSUTOSHI, TAKEYAMA TADAO
Format: Patent
Sprache:eng
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Zusammenfassung:PURPOSE:To obtain the titled resin having high heat resistance, high hardness and low water absorption, by radically polymerizing an acrylic compound having a specific structural formula. CONSTITUTION:Preferably 0.01-0.1pts.wt. radical initiator, e.g. benzoyl peroxide, is added to a compound expressed by the formula (R is H or CH3), e.g. 1,4-bis(methacryloyloxymethyl)cyclohexane, and reacted therewith at 10-150 deg.C preferably in the air to give the aimed resin having generally >=85% light transmittance, =200 deg.C heat resistance and >=2H pencil hardness.