PHOTOMASK

PURPOSE:To restrain chemical reaction, the occurrence of mold and bacteria in the inside of a pellicle, and to prevent the occurrence of foreign matter and the defects of a pattern by forming bubbles in a stand, and enabling the air to flow inward and outward. CONSTITUTION:The stand plate 4 made of...

Ausführliche Beschreibung

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Bibliographische Detailangaben
Hauptverfasser:	TSUUZAWA SOICHI, DAN MASAHIRO, KUMADA SHIGETO, KANEDA TAKESHI
Format:	Patent
Sprache:	eng
Schlagworte:	APPARATUS SPECIALLY ADAPTED THEREFOR BASIC ELECTRIC ELEMENTS CINEMATOGRAPHY ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY ELECTROGRAPHY HOLOGRAPHY MATERIALS THEREFOR ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS SEMICONDUCTOR DEVICES
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Beschreibung
Zusammenfassung:	PURPOSE:To restrain chemical reaction, the occurrence of mold and bacteria in the inside of a pellicle, and to prevent the occurrence of foreign matter and the defects of a pattern by forming bubbles in a stand, and enabling the air to flow inward and outward. CONSTITUTION:The stand plate 4 made of aluminum is erected around the surface of a glass plate 2 in a whole frame structure surrounding a mask pattern 3, and bonded to the surface of the glass plate with an adhesive. A transparent thin film, that is, a pellicle 5 made of the org. material of nitrocellulose or the like is stretched and bonded to the upper ends of the stand 4 with an adhesive, thus insulating the pattern face of a photomask, i.e., the surface of the glass plate 2 with the pellicle 5 and the stad 4. On the other hand, the stand 4 is provided with plural bubbles 6 on the circumference to allow the air to flow between the inside and the outside of the pellicle 5.