METHOD OF REMOVING PARTICLE IN EMULSION MASK

PURPOSE:To remove particles positively by sucking and removing the particles adhering on an emulsion mask by a jig on which static electricity is charged. CONSTITUTION:Static electricity is charged previously to a needle-like jig 3, and the needle tip of the jig 3 is brought near at a distance of 1-...

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Bibliographische Detailangaben
1. Verfasser:	HOSHINO SHIGEYUKI
Format:	Patent
Sprache:	eng
Schlagworte:	APPARATUS SPECIALLY ADAPTED THEREFOR BASIC ELECTRIC ELEMENTS CINEMATOGRAPHY ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY ELECTROGRAPHY HOLOGRAPHY MATERIALS THEREFOR ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS SEMICONDUCTOR DEVICES
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Beschreibung
Zusammenfassung:	PURPOSE:To remove particles positively by sucking and removing the particles adhering on an emulsion mask by a jig on which static electricity is charged. CONSTITUTION:Static electricity is charged previously to a needle-like jig 3, and the needle tip of the jig 3 is brought near at a distance of 1-3mm to a particle 2 under the state in which an emulsion mask 1 is scaled up and viewed through a microscope. Consequently, the particle 2 is separated from the emulsion mask 1, and sucked to the needle tip of the jig 3 on which static electricity is charged. The jig 3 is brought near a suction port 5 under a vacuum to suck and discharge the particle 2. Accordingly, the particle can be removed without being brought into contact with the mask, and fine particles are also removed while the adhesion of novel particles can also be prevented.