SCANNING ELECTRON MICROSCOPE

PURPOSE:To make it possible to perform locating procedure in point analysis very easily, by providing a generating device of two electron beams, and conducting the irradiation of scanning image with 1st electron beam, and of fixed point with 2nd electron beam. CONSTITUTION:The electron beam emitted from electron gun 1 is accelerated by anode 2, and ejected into deflexion coil portion 4 through a focusing lens system 3. And then, the beam is radiated on a sample 6 through an objective lens 5. In addition, 2nd electron gun 7 is provided, and also the electron beam emitted from it and accelerated by an anode 8 is radiated on the sample 6 similarly through deflection plates 9. When this electron beam emitted from the 2nd electron gun is used only for point analysis, it is sufficient to provide a deflection function only to correct a slight dislocation. Therefore, the electron gun 7 and focusing and deflecting system 9 can be made only with small and simple structures.