MASK INSPECTING INSTRUMENT

PURPOSE:To detect a mask pattern as two-dimensional image information at a time and to shorten the inspecting time by generating a photoelectron according to the mask pattern and enlarging this and image-forming it on a detecting part arranging detecting elements two-dimensionally. CONSTITUTION:In a...

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Bibliographische Detailangaben
Hauptverfasser:	TSUYUSAKI HARUO, SHIMAZU NOBUO
Format:	Patent
Sprache:	eng
Schlagworte:	APPARATUS SPECIALLY ADAPTED THEREFOR BASIC ELECTRIC ELEMENTS CINEMATOGRAPHY ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY ELECTROGRAPHY HOLOGRAPHY INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIRCHEMICAL OR PHYSICAL PROPERTIES MATERIALS THEREFOR MEASURING MEASURING ANGLES MEASURING AREAS MEASURING IRREGULARITIES OF SURFACES OR CONTOURS MEASURING LENGTH, THICKNESS OR SIMILAR LINEARDIMENSIONS ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS SEMICONDUCTOR DEVICES TESTING
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Beschreibung
Zusammenfassung:	PURPOSE:To detect a mask pattern as two-dimensional image information at a time and to shorten the inspecting time by generating a photoelectron according to the mask pattern and enlarging this and image-forming it on a detecting part arranging detecting elements two-dimensionally. CONSTITUTION:In an electron ray generating part 200, X rays or ultraviolet rays 201 are irradiated on the mask pattern 220 and the photoelectron 202 corresponding to the mask pattern 220 is generated from a thin film 240 for generating the photoelectron by the X rays or the ultraviolet rays which are not shielded by the pattern 220. This photoelectron 202 is enlarged by an electronic optical system 300 and image-formed for a two-dimensional image. The detecting elements are arranged two-dimensionally to form the electron ray detecting part 400 on this image-form face, and the mask pattern 220 is detected two-dimensionally from the outputs of these detecting elements. It is desirable that a detecting area of the mask pattern 220 is moved in order by providing a driving device 500.