PHOTO-SENSITIVE COMPOSITION AND LAMINATE CONTAINING SAME

PHOTO-SENSITIVE COMPOSITION AND LAMINATE CONTAINING SAME

PURPOSE:To provide the titled novel composition having high sensitivity and excellent surface curability, and useful as a photoresist, etc., by compounding a polymer having specific side chain, a non-gaseous unsaturated compound having plural C=C bonds, and a photo-polymerization initiator containin...

Ausführliche Beschreibung

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Bibliographische Detailangaben
Hauptverfasser: IKEDA AKIHIKO, KANEKO SHUNEI, AI HIDEO
Format: Patent
Sprache:eng
Schlagworte:
APPARATUS SPECIALLY ADAPTED THEREFOR
CHEMISTRY
CINEMATOGRAPHY
COMPOSITIONS BASED THEREON
ELECTROGRAPHY
HOLOGRAPHY
MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVINGCARBON-TO-CARBON UNSATURATED BONDS
MATERIALS THEREFOR
METALLURGY
ORGANIC MACROMOLECULAR COMPOUNDS
ORIGINALS THEREFOR
PHOTOGRAPHY
PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES
PHYSICS
THEIR PREPARATION OR CHEMICAL WORKING-UP
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Beschreibung
Zusammenfassung:PURPOSE:To provide the titled novel composition having high sensitivity and excellent surface curability, and useful as a photoresist, etc., by compounding a polymer having specific side chain, a non-gaseous unsaturated compound having plural C=C bonds, and a photo-polymerization initiator containing benzophenone skeleton. CONSTITUTION:The objective composition is produced by compounding (A) a polymer having the side chain of formula [Ar is 6-14C aromatic hydrocarbon group; R1 and R2 are 1-8C alkyl or phenylalkyl, or R1 and R2 together form -(CH2)m- (m is integer of 3-6)], (B) a non-gaseous unsaturated compound having >=2 C=C bonds (preferably trimethylolpropane triacrylate), and (C) a photo-poly merization initiator having benzophenone skeleton (preferably chlorothioxanthone, etc.). The component A is preferably a polymer of styrene, methyl methacrylate, and p-N,N-dimethylaminobenzoic acid having the group of formula, etc.