MANUFACTURE OF SOLID-STAGE IMAGE SENSOR

PURPOSE:To prevent overhang projections from becoming dusts by etching a metal film formed with a reflection preventive film on the surface, and then removing the projection of the reflection preventive film formed in this case with etchant. CONSTITUTION:A light shielding metal film 2 is entirely formed on the surface of a semiconductor substrate 1 formed with an image sensor, and a reflection preventive film 3 is formed on the surface of the film 2. Then, a resist film 4 having the prescribed pattern is formed on the surface of the film 3. Then, with the film 4 as a mask the film 3 is etched. Then, with the film 4 as a mask the film 2 is etched. Then, overhang projections 6 to the window 5 of the film 2 are formed. Thereafter, the substrate 1 is dipped in an etchant for the film 2 to etch and remove the projections 6. Subsequently, the film 4 is removed. The above manufacturing method can eliminate the possibility of causing the projections 6 in the step of separating the film 4 and other steps from becoming dusts due to breakage.