APPROPRIATE PHOTOSENSITIVE RECORDING MATERIAL FOR MANUFACTURING RELIEF IMAGE OR RESIST PATTERN

1. A photosensitive recording material which is suitable for the production of relief or resist images and possesses a curable, photosensitive layer (S) which is applied to a dimensionally stable base and which contains a) a compound possessing two or more aromatic and/or heteroaromatic o-nitrocarbinol ester groups of the general formula (I) see diagramm : EP0132710,P13,F1 where A is a radical of an unsubstituted or substituted, 5-membered to 14-membered aromatic or heteroaromatic ring system, and X is hydrogen, alkyl of 1 to 8 carbon atoms or an unsubstituted or substituted aryl or aralkyl radical, b) a compound which effects crosslinking and possesses two or more reactive groups which are capable of reacting with -COOH groups under the action of heat to form a covalent chemical bond, and c) one or more catalysts for the reaction of the compound (b), which effects crosslinking, with COOH-containing compounds, with or without d) conventional additives and/or assistants, wherein there is contained, as component (c), at least one catalyst which is present in a blocked non-active form and can be activated photochemically with actinic light and/or thermally.