MANUFACTURE OF SLIGHTLY HALOGENATED SILANE OR MONOSILANE

PURPOSE:To manufacture efficiently a slightly halogenated silane or monosilane at a low cost by bringing a halogenosilane into contact with a specified polyamine compound. CONSTITUTION:A polyamine compound such as ethylenediamine is dissolved in a solvent to prepare a soln. A carrier such as activat...

Ausführliche Beschreibung

Gespeichert in:
Bibliographische Detailangaben
Hauptverfasser: HIRASHIMA TAKEYUKI, KOGA SHINICHIROU, OZAKI YASUTAKA
Format: Patent
Sprache:eng
Schlagworte:
Online-Zugang:Volltext bestellen
Tags: Tag hinzufügen
Keine Tags, Fügen Sie den ersten Tag hinzu!
container_end_page
container_issue
container_start_page
container_title
container_volume
creator HIRASHIMA TAKEYUKI
KOGA SHINICHIROU
OZAKI YASUTAKA
description PURPOSE:To manufacture efficiently a slightly halogenated silane or monosilane at a low cost by bringing a halogenosilane into contact with a specified polyamine compound. CONSTITUTION:A polyamine compound such as ethylenediamine is dissolved in a solvent to prepare a soln. A carrier such as activated carbon, alumina or silica- alumina is dipped in the soln. and dried. A halogenosilane represented by a formula SiHX3, SiH2X2 or SiH3X (where X is halogen) is brought into contact with the carrier having the deposited polyamine compound at 25-350 deg.C for 0.1-60sec. A slightly halogenated silane or monosilane can be manufactured without producing a silane of higher order as a by-product.
format Patent
fullrecord <record><control><sourceid>epo_EVB</sourceid><recordid>TN_cdi_epo_espacenet_JPS6060918A</recordid><sourceformat>XML</sourceformat><sourcesystem>PC</sourcesystem><sourcerecordid>JPS6060918A</sourcerecordid><originalsourceid>FETCH-epo_espacenet_JPS6060918A3</originalsourceid><addsrcrecordid>eNrjZLDwdfQLdXN0DgkNclXwd1MI9vF09wjxiVTwcPTxd3f1cwxxdVEI9vRx9ANKByn4-vv5Q3g8DKxpiTnFqbxQmptBwc01xNlDN7UgPz61uCAxOTUvtSTeKyDYzMDMwNLQwtGYCCUAKzkofw</addsrcrecordid><sourcetype>Open Access Repository</sourcetype><iscdi>true</iscdi><recordtype>patent</recordtype></control><display><type>patent</type><title>MANUFACTURE OF SLIGHTLY HALOGENATED SILANE OR MONOSILANE</title><source>esp@cenet</source><creator>HIRASHIMA TAKEYUKI ; KOGA SHINICHIROU ; OZAKI YASUTAKA</creator><creatorcontrib>HIRASHIMA TAKEYUKI ; KOGA SHINICHIROU ; OZAKI YASUTAKA</creatorcontrib><description>PURPOSE:To manufacture efficiently a slightly halogenated silane or monosilane at a low cost by bringing a halogenosilane into contact with a specified polyamine compound. CONSTITUTION:A polyamine compound such as ethylenediamine is dissolved in a solvent to prepare a soln. A carrier such as activated carbon, alumina or silica- alumina is dipped in the soln. and dried. A halogenosilane represented by a formula SiHX3, SiH2X2 or SiH3X (where X is halogen) is brought into contact with the carrier having the deposited polyamine compound at 25-350 deg.C for 0.1-60sec. A slightly halogenated silane or monosilane can be manufactured without producing a silane of higher order as a by-product.</description><language>eng</language><subject>CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOIDCHEMISTRY ; CHEMISTRY ; COMPOUNDS THEREOF ; INORGANIC CHEMISTRY ; METALLURGY ; NON-METALLIC ELEMENTS ; PERFORMING OPERATIONS ; PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL ; THEIR RELEVANT APPARATUS ; TRANSPORTING</subject><creationdate>1985</creationdate><oa>free_for_read</oa><woscitedreferencessubscribed>false</woscitedreferencessubscribed></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><linktohtml>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&amp;date=19850408&amp;DB=EPODOC&amp;CC=JP&amp;NR=S6060918A$$EHTML$$P50$$Gepo$$Hfree_for_read</linktohtml><link.rule.ids>230,308,776,881,25542,76289</link.rule.ids><linktorsrc>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&amp;date=19850408&amp;DB=EPODOC&amp;CC=JP&amp;NR=S6060918A$$EView_record_in_European_Patent_Office$$FView_record_in_$$GEuropean_Patent_Office$$Hfree_for_read</linktorsrc></links><search><creatorcontrib>HIRASHIMA TAKEYUKI</creatorcontrib><creatorcontrib>KOGA SHINICHIROU</creatorcontrib><creatorcontrib>OZAKI YASUTAKA</creatorcontrib><title>MANUFACTURE OF SLIGHTLY HALOGENATED SILANE OR MONOSILANE</title><description>PURPOSE:To manufacture efficiently a slightly halogenated silane or monosilane at a low cost by bringing a halogenosilane into contact with a specified polyamine compound. CONSTITUTION:A polyamine compound such as ethylenediamine is dissolved in a solvent to prepare a soln. A carrier such as activated carbon, alumina or silica- alumina is dipped in the soln. and dried. A halogenosilane represented by a formula SiHX3, SiH2X2 or SiH3X (where X is halogen) is brought into contact with the carrier having the deposited polyamine compound at 25-350 deg.C for 0.1-60sec. A slightly halogenated silane or monosilane can be manufactured without producing a silane of higher order as a by-product.</description><subject>CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOIDCHEMISTRY</subject><subject>CHEMISTRY</subject><subject>COMPOUNDS THEREOF</subject><subject>INORGANIC CHEMISTRY</subject><subject>METALLURGY</subject><subject>NON-METALLIC ELEMENTS</subject><subject>PERFORMING OPERATIONS</subject><subject>PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL</subject><subject>THEIR RELEVANT APPARATUS</subject><subject>TRANSPORTING</subject><fulltext>true</fulltext><rsrctype>patent</rsrctype><creationdate>1985</creationdate><recordtype>patent</recordtype><sourceid>EVB</sourceid><recordid>eNrjZLDwdfQLdXN0DgkNclXwd1MI9vF09wjxiVTwcPTxd3f1cwxxdVEI9vRx9ANKByn4-vv5Q3g8DKxpiTnFqbxQmptBwc01xNlDN7UgPz61uCAxOTUvtSTeKyDYzMDMwNLQwtGYCCUAKzkofw</recordid><startdate>19850408</startdate><enddate>19850408</enddate><creator>HIRASHIMA TAKEYUKI</creator><creator>KOGA SHINICHIROU</creator><creator>OZAKI YASUTAKA</creator><scope>EVB</scope></search><sort><creationdate>19850408</creationdate><title>MANUFACTURE OF SLIGHTLY HALOGENATED SILANE OR MONOSILANE</title><author>HIRASHIMA TAKEYUKI ; KOGA SHINICHIROU ; OZAKI YASUTAKA</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-epo_espacenet_JPS6060918A3</frbrgroupid><rsrctype>patents</rsrctype><prefilter>patents</prefilter><language>eng</language><creationdate>1985</creationdate><topic>CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOIDCHEMISTRY</topic><topic>CHEMISTRY</topic><topic>COMPOUNDS THEREOF</topic><topic>INORGANIC CHEMISTRY</topic><topic>METALLURGY</topic><topic>NON-METALLIC ELEMENTS</topic><topic>PERFORMING OPERATIONS</topic><topic>PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL</topic><topic>THEIR RELEVANT APPARATUS</topic><topic>TRANSPORTING</topic><toplevel>online_resources</toplevel><creatorcontrib>HIRASHIMA TAKEYUKI</creatorcontrib><creatorcontrib>KOGA SHINICHIROU</creatorcontrib><creatorcontrib>OZAKI YASUTAKA</creatorcontrib><collection>esp@cenet</collection></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext_linktorsrc</fulltext></delivery><addata><au>HIRASHIMA TAKEYUKI</au><au>KOGA SHINICHIROU</au><au>OZAKI YASUTAKA</au><format>patent</format><genre>patent</genre><ristype>GEN</ristype><title>MANUFACTURE OF SLIGHTLY HALOGENATED SILANE OR MONOSILANE</title><date>1985-04-08</date><risdate>1985</risdate><abstract>PURPOSE:To manufacture efficiently a slightly halogenated silane or monosilane at a low cost by bringing a halogenosilane into contact with a specified polyamine compound. CONSTITUTION:A polyamine compound such as ethylenediamine is dissolved in a solvent to prepare a soln. A carrier such as activated carbon, alumina or silica- alumina is dipped in the soln. and dried. A halogenosilane represented by a formula SiHX3, SiH2X2 or SiH3X (where X is halogen) is brought into contact with the carrier having the deposited polyamine compound at 25-350 deg.C for 0.1-60sec. A slightly halogenated silane or monosilane can be manufactured without producing a silane of higher order as a by-product.</abstract><oa>free_for_read</oa></addata></record>
fulltext fulltext_linktorsrc
identifier
ispartof
issn
language eng
recordid cdi_epo_espacenet_JPS6060918A
source esp@cenet
subjects CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOIDCHEMISTRY
CHEMISTRY
COMPOUNDS THEREOF
INORGANIC CHEMISTRY
METALLURGY
NON-METALLIC ELEMENTS
PERFORMING OPERATIONS
PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
THEIR RELEVANT APPARATUS
TRANSPORTING
title MANUFACTURE OF SLIGHTLY HALOGENATED SILANE OR MONOSILANE
url https://sfx.bib-bvb.de/sfx_tum?ctx_ver=Z39.88-2004&ctx_enc=info:ofi/enc:UTF-8&ctx_tim=2025-02-06T10%3A27%3A58IST&url_ver=Z39.88-2004&url_ctx_fmt=infofi/fmt:kev:mtx:ctx&rfr_id=info:sid/primo.exlibrisgroup.com:primo3-Article-epo_EVB&rft_val_fmt=info:ofi/fmt:kev:mtx:patent&rft.genre=patent&rft.au=HIRASHIMA%20TAKEYUKI&rft.date=1985-04-08&rft_id=info:doi/&rft_dat=%3Cepo_EVB%3EJPS6060918A%3C/epo_EVB%3E%3Curl%3E%3C/url%3E&disable_directlink=true&sfx.directlink=off&sfx.report_link=0&rft_id=info:oai/&rft_id=info:pmid/&rfr_iscdi=true